发明授权
- 专利标题： Immersion lithographic apparatus and device manufacturing method
- 专利标题（中）： 浸没式光刻设备及器件制造方法
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申请号： US12775045申请日： 2010-05-06
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公开(公告)号： US08405819B2公开(公告)日： 2013-03-26
- 发明人: Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
- 申请人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/58
摘要：
In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
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