发明授权
US08420541B2 Method for increasing adhesion between polysilazane and silicon nitride
有权
增加聚硅氮烷和氮化硅之间粘附力的方法
- 专利标题: Method for increasing adhesion between polysilazane and silicon nitride
- 专利标题(中): 增加聚硅氮烷和氮化硅之间粘附力的方法
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申请号: US13102506申请日: 2011-05-06
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公开(公告)号: US08420541B2公开(公告)日: 2013-04-16
- 发明人: Shing-Yih Shih , Yi-Nan Chen , Hsien-Wen Liu
- 申请人: Shing-Yih Shih , Yi-Nan Chen , Hsien-Wen Liu
- 申请人地址: TW Taoyuan
- 专利权人: Nanya Technology Corporation
- 当前专利权人: Nanya Technology Corporation
- 当前专利权人地址: TW Taoyuan
- 主分类号: H01L21/311
- IPC分类号: H01L21/311 ; H01L21/31
摘要:
A method for increasing adhesion between polysilazane and silicon nitride is disclosed, comprising, providing a substrate comprising a trench, forming a silicon nitride liner layer on a bottom surface and a sidewall of the trench, performing a treating process to the silicon nitride liner layer for producing a hydrophilic surface with OH groups that can increase adhesion between the silicon nitride liner layer and a subsequently formed polysilazane coating layer, and forming a polysilazane coating layer into the trench and on the silicon nitride liner layer.
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