发明授权
- 专利标题: Projection objective for microlithography
- 专利标题(中): 微光刻的投影目标
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申请号: US12723496申请日: 2010-03-12
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公开(公告)号: US08436982B2公开(公告)日: 2013-05-07
- 发明人: Helmut Beierl , Heiko Feldmann , Jochen Hetzler , Michael Totzeck
- 申请人: Helmut Beierl , Heiko Feldmann , Jochen Hetzler , Michael Totzeck
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 优先权: DE102007047148 20071002
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/52 ; G03B27/42
摘要:
A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.
公开/授权文献
- US20100201959A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 公开/授权日:2010-08-12