Invention Grant
- Patent Title: Masked ion implant with fast-slow scan
- Patent Title (中): 具有快速扫描的掩蔽离子植入物
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Application No.: US13188837Application Date: 2011-07-22
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Publication No.: US08461553B2Publication Date: 2013-06-11
- Inventor: Nicholas P. T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
- Applicant: Nicholas P. T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/244 ; H01J3/07 ; G21K5/10

Abstract:
An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
Public/Granted literature
- US20110272602A1 Masked Ion Implant with Fast-Slow Scan Public/Granted day:2011-11-10
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