公开(公告)号：US09087672B2

公开(公告)日：2015-07-21

申请号：US14565051

申请日：2014-12-09

Applicant: FEI Company

Inventor： Mostafa Maazouz

IPC: H01J3/07 ,  H01J37/08 ,  H01J49/10 ,  H01J49/26 ,  H01J37/147 ,  H01J37/06 ,  H01J37/248

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：US08399852B2

公开(公告)日：2013-03-19

申请号：US13303941

申请日：2011-11-23

Applicant: Alexander Klein ,  Matthew Wittman ,  Scott Rackey

Inventor： Alexander Klein ,  Matthew Wittman ,  Scott Rackey

IPC: H01J3/07 ,  H01J3/14 ,  H01J3/18 ,  H01J3/20 ,  H01J27/51

CPC classification number: H01J37/04 ,  G21B1/15 ,  H01J49/06 ,  H05H7/06 ,  Y02E30/16

Abstract: The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.

Abstract translation: 本文所述的系统和方法涉及使用静电元件或静电和磁性元件的组合来将带电粒子限制在稳定的再循环的被捕获的轨道中。 更具体地说，本发明涉及用于沿公共轴加速和聚焦具有多个能量和任意极性的多个带电粒子束的系统和方法。

公开(公告)号：US08835868B2

公开(公告)日：2014-09-16

申请号：US14108844

申请日：2013-12-17

Applicant: NuFlare Technology, Inc.

Inventor： Takanao Touya ,  Munehiro Ogasawara

IPC: H01J3/07 ,  H01J37/141 ,  G21K5/04 ,  H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/04922 ,  Y10S430/143

Abstract: A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.

Abstract translation: 一种多带电粒子束写入装置，包括：载置目标物体并可移动的载台，发射带电粒子束的发射单元，形成有多个开口的孔径构件，通过放电产生多个波束 对包含整个多个开口的区域照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，还原光学系统以减少多个光束，并且双峰 透镜，布置在还原光学系统的后续阶段，其中放大率为1，磁通量的方向相反。

公开(公告)号：US08772734B2

公开(公告)日：2014-07-08

申请号：US13727710

申请日：2012-12-27

Applicant: Canon Kabushiki Kaisha

Inventor： Toshiro Yamanaka

IPC: H01J3/07 ,  H01J37/147 ,  H01J3/26

CPC classification number: G21K5/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/026 ,  H01J2237/0435 ,  H01J2237/31794

Abstract: A lithograph apparatus that performs writing on a substrate with a plurality of charged particle beams. A blanking deflector array blanks the plurality of charged particle beams. An aperture array blocks n charged particle beam deflected by the blanking deflector array. A sealing mechanism seals an opening or at least one of the blanking deflector array and the aperture array with a shielding material that shields a charged particle beam. A moving mechanism moves the substrate so that the writing is performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.

Abstract translation: 在多个带电粒子束的基板上进行写入的平版印刷装置。 消隐偏转器阵列空白多个带电粒子束。 孔径阵列阻挡由消隐偏转器阵列偏转的带电粒子束。 密封机构利用遮蔽带电粒子束的屏蔽材料来密封消隐偏转器阵列和孔径阵列中的开口或至少一个。 移动机构移动基板，使得用可无遮挡的带电粒子束执行写入，而不是屏蔽材料屏蔽的不可白化的带电粒子束。

公开(公告)号：US06906453B2

公开(公告)日：2005-06-14

申请号：US10842899

申请日：2004-05-10

Applicant: Michael Mauck

Inventor： Michael Mauck

IPC: G21K1/00 ,  C23C14/54 ,  G21K1/093 ,  G21K5/04 ,  H01J3/07 ,  H01J37/04 ,  H01J37/147 ,  H01J37/153 ,  H01J37/21 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H05H7/06

CPC classification number: G01N23/04 ,  G21K1/093 ,  H01J37/147 ,  H01J37/3005 ,  H01J37/3007 ,  Y10S977/869 ,  Y10S977/881 ,  Y10S977/887 ,  Y10S977/89

Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.

Abstract translation: 一种用于连接至少两束带电粒子的系统，包括将第一光束沿着第一轴线引导到场中。 沿着第二轴将第二光束引导到场中。 第一和第二光束通过场和第一和第二光束之间的相互作用转动成沿着第三轴指向的第三光束。

公开(公告)号：US08461553B2

公开(公告)日：2013-06-11

申请号：US13188837

申请日：2011-07-22

Applicant: Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

Inventor： Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

IPC: H01J37/317 ,  H01J37/244 ,  H01J3/07 ,  G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/20228 ,  H01J2237/31711 ,  H01L21/266 ,  H01L31/068 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.

Abstract translation: 制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。 离子束被引导通过掩模中的多个孔朝向衬底。 衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。 通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。 这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

公开(公告)号：US07253417B2

公开(公告)日：2007-08-07

申请号：US10539179

申请日：2003-12-12

Applicant: Jürgen Frosien ,  Pavel Adamec

Inventor： Jürgen Frosien ,  Pavel Adamec

IPC: H01J3/07 ,  H01J29/51

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177

Abstract: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

Abstract translation: 本发明提供了一种用于带电粒子多光束系统的光学系统。 光学系统包括静电透镜部件和磁性透镜部件。 这些部件用于将多个带电粒子束聚焦在分开的开口中，用于至少多个穿过光学系统的带电粒子束中的每一个。

公开(公告)号：US06946665B2

公开(公告)日：2005-09-20

申请号：US10909300

申请日：2004-08-03

Applicant: Masato Muraki ,  Yoshinori Nakayama ,  Hiroya Ohta ,  Haruo Yoda ,  Norio Saitou

Inventor： Masato Muraki ,  Yoshinori Nakayama ,  Hiroya Ohta ,  Haruo Yoda ,  Norio Saitou

IPC: G03F7/20 ,  H01J37/04 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J3/07 ,  H01J3/14

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/317

Abstract: A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams includes a first measurement member for making the plurality of charged particle beams come incident and measuring a total current value of the charged particle beams. A second measurement member makes the plurality of charged particle beams come incident and multiplies electrons of each of the incident charged particle beams, thereby measuring a relative value of a current of each of the charged particle beams.

Abstract translation: 使用多个带电粒子束曝光基板的带电粒子束曝光装置包括用于使多个带电粒子束入射的第一测量部件，并测量带电粒子束的总电流值。 第二测量构件使多个带电粒子束入射并乘以每个入射带电粒子束的电子，从而测量每个带电粒子束的电流的相对值。

公开(公告)号：US4645978A

公开(公告)日：1987-02-24

申请号：US621579

申请日：1984-06-18

Applicant: Robin J. Harvey ,  Hayden E. Gallagher

Inventor： Robin J. Harvey ,  Hayden E. Gallagher

IPC: H01J3/07 ,  H01J3/02 ,  H01J3/04 ,  H01J17/38 ,  H01J17/44 ,  H01S3/09 ,  H01S3/097 ,  H01J7/24

CPC classification number: H01J3/021 ,  H01J17/44

Abstract: An electron beam controlled switch employing a radial geometry and a Wire-Ion Plasma-Electron gun (WIP E-gun) as an electron source is disclosed. The switch comprises an inner cylinder that serves as the WIP E-gun cathode, a cylindrical grid that serves as the WIP E-gun anode, an array of fine wire anodes disposed in the WIP E-gun ionization chamber, a foil support cylinder to support the foil windows which also serve as the switch anode, and an outer cylinder which also serves as the switch cathode. The WIP E-gun and ionization chamber is gas filled at low pressure, while the switch cavity is filled with a high pressure gas. A voltage pulse is applied to the wire anodes to ionize the gas in the ionization chamber. The ions are extracted through the chamber grid and accelerated through a high voltage to bombard the E-gun cathode. The electrons emitted from the ion bombardment are accelerated outwardly through the high voltage, penetrate through the foil windows and into the pressurized gas in the switch cavity. The high energy electrons ionize the gas between the switch anode and cathode, thereby turning "ON" the switch. In the absence of the electron beam, the switch gas deionizes and switch conduction is quickly extinguished.

Abstract translation: 公开了采用放射状几何形状的电子束控制开关和线离子等离子体电子枪（WIP E-gun）作为电子源。 开关包括用作WIP电子枪阴极的内筒，用作WIP E枪阳极的圆柱形栅格，设置在WIP E枪电离室中的细线阳极阵列，箔支撑筒 支撑也用作开关阳极的箔窗以及也用作开关阴极的外筒。 WIP电子枪和电离室在低压下充满气体，而开关腔充满高压气体。 对电线阳极施加电压脉冲以电离电离室中的气体。 离子通过室格栅提取，并通过高压加速轰击电子枪阴极。 从离子轰击发射的电子通过高电压向外加速，穿过箔窗口并进入开关腔中的加压气体。 高能电子使开关阳极和阴极之间的气体电离，从而使开关“开”。 在没有电子束的情况下，开关气体去离子并且开关导通快速熄灭。

公开(公告)号：US08492732B2

公开(公告)日：2013-07-23

申请号：US13633468

申请日：2012-10-02

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro Ogasawara

IPC: H01J3/07 ,  H01J37/141 ,  G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/0435 ,  H01J2237/045

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.

Abstract translation: 根据本发明的一个方面的多带电粒子束写入装置包括形成多个光束的第一孔径构件，设置有分别对多个光束中的对应光束进行消隐偏转的多个消隐器的消隐器阵列，第一 电磁透镜和布置在所述第一孔径构件和所述遮蔽器阵列之间的第二电磁透镜，布置在所述第一电磁透镜和所述第二电磁透镜之间并且在所述多个光束的会聚点的位置处的第二孔径构件， 的带电粒子偏离会聚点，以及第三孔径构件，用于阻挡被多个阻挡器偏转成束束状态的每个束。