发明授权
US08493545B2 Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port
有权
清洁方法,用于浸没光刻中的清洁液体,将清洁液体提供到光学元件,液体供应口和液体回收口下面的物体表面上
- 专利标题: Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port
- 专利标题(中): 清洁方法,用于浸没光刻中的清洁液体,将清洁液体提供到光学元件,液体供应口和液体回收口下面的物体表面上
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申请号: US12382078申请日: 2009-03-09
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公开(公告)号: US08493545B2公开(公告)日: 2013-07-23
- 发明人: Hidemi Kawai , W. Thomas Novak
- 申请人: Hidemi Kawai , W. Thomas Novak
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 主分类号: G03B27/52
- IPC分类号: G03B27/52
摘要:
An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.
公开/授权文献
- US20090174872A1 Cleanup method for optics in immersion lithography 公开/授权日:2009-07-09
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