公开(公告)号：US08493545B2

公开(公告)日：2013-07-23

申请号：US12382078

申请日：2009-03-09

申请人： Hidemi Kawai ,  W. Thomas Novak

发明人： Hidemi Kawai ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

摘要翻译： 浸渍光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 与工件不同的物体的表面设置在光学元件的下方，供给口和回收口。 在净化过程中，清洁液体被供应到物体上，使得清洁液仅覆盖物体表面的一部分。

公开(公告)号：US20090161084A1

公开(公告)日：2009-06-25

申请号：US12379171

申请日：2009-02-13

申请人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

发明人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

摘要翻译： 光刻设备包括其上保持有基板的基板台，包括最终光学元件的投影系统，所述投影系统将图案化的辐射束通过浸没液投射到邻近最终光学元件的基板上，以在 浸渍光刻工艺，以及包括入口的液体供应系统。 液体供应系统在浸没式光刻工艺期间提供浸没液体，并在净化过程中提供与浸没液体不同的清洗液体。 清理工艺和浸没光刻工艺在不同时间进行。

公开(公告)号：US08085381B2

公开(公告)日：2011-12-27

申请号：US11704241

申请日：2007-02-09

申请人： Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

发明人： Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A megasonic immersion lithography exposure apparatus includes an optical transfer chamber for containing an exposure liquid, at least one megasonic plate operably engaging said optical transfer chamber for propagating sonic waves through the exposure liquid, and an optical system provided adjacent to said optical transfer chamber for projecting light through a mask and said exposure liquid and onto a wafer.

摘要翻译： 兆声浸没式光刻曝光装置包括用于容纳曝光液体的光学传送室，至少一个与所述光学传送室可操作地接合以便通过曝光液体传播声波的兆声道板，以及邻近所述光学传送室设置的光学系统， 通过掩模和所述曝光液体照射到晶片上。

公开(公告)号：US20090195762A1

公开(公告)日：2009-08-06

申请号：US12382162

申请日：2009-03-10

申请人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

发明人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.

摘要翻译： 浸没式光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间，从液体供应构件将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 物体的与工件不同的表面被设置成使得物体和光学元件的表面彼此相对。 在净化处理中，从液体供给部件将清洗液供给到物体的表面。

公开(公告)号：US20090174872A1

公开(公告)日：2009-07-09

申请号：US12382078

申请日：2009-03-09

申请人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

发明人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

摘要翻译： 浸渍光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 与工件不同的物体的表面设置在光学元件的下方，供给口和回收口。 在净化过程中，清洁液体被供应到物体上，使得清洁液仅覆盖物体表面的一部分。

公开(公告)号：US07522259B2

公开(公告)日：2009-04-21

申请号：US11237651

申请日：2005-09-29

申请人： Andrew J Hazelton ,  Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

发明人： Andrew J Hazelton ,  Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.

摘要翻译： 浸没式光刻设备具有分隔板台，其布置成保持掩模版，布置成保持工件的工作台，以及包括照明源和与工件相对的光学元件的光学系统，用于具有通过辐射投射的掩模版的图像图案 照明源。 在光学元件和工件之间限定间隙，并且流体供应装置用于将浸没液体供应到该间隙中，使得所提供的浸没液体在浸没式光刻工艺期间与光学元件和工件接触。 一种清洁装置，用于在净化过程中从光学元件中去除吸收的液体。 清洁装置可以利用对吸收的液体具有亲和性的清洁液体，热，真空条件，超声波振动或气泡以去除吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

公开(公告)号：US08670103B2

公开(公告)日：2014-03-11

申请号：US12003038

申请日：2007-12-19

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.

摘要翻译： 液浸曝光装置包括通过曝光用光线曝光基板的光学系统和通过用包含气泡的液体填充与光学系统相邻的空间进行清洁操作的清洁装置。

公开(公告)号：US5671057A

公开(公告)日：1997-09-23

申请号：US698095

申请日：1996-08-15

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An alignment method for use with an exposure apparatus including first and second alignment sensor systems for establishing alignment between a reticle and a wafer. A first one of reticles in a reticle set is loaded on the exposure apparatus and the position of the pattern center of the reticle is determined. At the same time, the position of the detection center of the first alignment sensor system is determined and the baseline amount B.sub.11, which is the distance from the pattern center of the reticle to the detection center of the first alignment sensor system, is determined. Then, the baseline amount B.sub.21 of the second alignment sensor system is determined, and the difference .DELTA.B (=B.sub.21 -B.sub.11) between the baseline amounts is calculated. For any of the second and later ones of the reticles in the reticle set, the baseline amount B.sub.12 of the first alignment sensor system is calculated in the same manner as the above whereas the baseline amount B.sub.22 of the second alignment sensor system is calculated as: B.sub.22 =B.sub.12 +.DELTA.B. Fine alignment procedure is performed by using the second alignment sensor system and based on the baseline B.sub.22 thus calculated, and the pattern of the reticle is printed on each of the shot areas on a substrate by exposure.

摘要翻译： 一种与曝光装置一起使用的对准方法，包括用于在掩模版和晶片之间建立对准的第一和第二对准传感器系统。 将掩模版组中的第一个掩模版装载在曝光装置上，并确定掩模版的图案中心的位置。 同时，确定第一对准传感器系统的检测中心的位置，并且确定基准线数量B11，该基线量B11是从第一对准传感器系统的标线图案的图案中心到检测中心的距离。 然后，确定第二对准传感器系统的基线量B21，并且计算基线量之间的差ΔTA（= B21-B11）。 对于标线组中的第二和后一个掩模版中的任一个，以与上述相同的方式计算第一对准传感器系统的基线量B12，而第二对准传感器系统的基线量B22被计算为： B22 = B12 + DELTA B.通过使用第二对准传感器系统并且基于如此计算的基线B22执行精细对准过程，并且通过曝光将印模的图案印刷在基板上的每个照射区域上。

公开(公告)号：US08670104B2

公开(公告)日：2014-03-11

申请号：US12382162

申请日：2009-03-10

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.

摘要翻译： 浸没式光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间，从液体供应构件将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 物体的与工件不同的表面被设置成使得物体和光学元件的表面彼此相对。 在净化处理中，从液体供给部件将清洗液供给到物体的表面。

公开(公告)号：US08269946B2

公开(公告)日：2012-09-18

申请号：US12379171

申请日：2009-02-13

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

摘要翻译： 光刻设备包括其上保持有基板的基板台，包括最终光学元件的投影系统，所述投影系统将图案化的辐射束通过浸没液投射到邻近最终光学元件的基板上，以在 浸渍光刻工艺，以及包括入口的液体供应系统。 液体供应系统在浸没式光刻工艺期间提供浸没液体，并在净化过程中提供与浸没液体不同的清洗液体。 清理工艺和浸没光刻工艺在不同时间进行。