发明授权
- 专利标题： Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
- 专利标题（中）： 无氟稠环杂芳族光酸产生剂和含有它的抗蚀剂组合物
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申请号： US13614521申请日： 2012-09-13
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公开(公告)号： US08518630B2公开(公告)日： 2013-08-27
- 发明人: Sen Liu , Pushkara R. Varanasi
- 申请人： Sen Liu , Pushkara R. Varanasi
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理商 Parashos Kalaitzis; Kevin B. Anderson
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/028 ; G03F7/029 ; G03F7/26 ; C07C309/04 ; C07C309/25 ; C07C309/39 ; C07C309/40
摘要：
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
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