发明授权
- 专利标题： Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound
- 专利标题（中）： 化合物，含氟聚合物，辐射敏感性树脂组合物及其制备方法
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申请号： US13216209申请日： 2011-08-23
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公开(公告)号： US08530692B2公开(公告)日： 2013-09-10
- 发明人: Nobuji Matsumura , Yuusuke Asano , Hirokazu Sakakibara , Yukio Nishimura , Takehiko Naruoka
- 申请人： Nobuji Matsumura , Yuusuke Asano , Hirokazu Sakakibara , Yukio Nishimura , Takehiko Naruoka
- 申请人地址： JP Tokyo
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 优先权： JP2009-039085 20090223
- 主分类号： C07C68/00
- IPC分类号： C07C68/00 ; C07C69/96 ; C08F20/28 ; G03F7/039
摘要：
A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.
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