Compound, polymer, and radiation-sensitive composition
    1.
    发明授权
    Compound, polymer, and radiation-sensitive composition 有权
    化合物,聚合物和辐射敏感组合物

    公开(公告)号:US08697331B2

    公开(公告)日:2014-04-15

    申请号:US12949795

    申请日:2010-11-19

    IPC分类号: G03F7/004 G03F7/039

    摘要: A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.

    摘要翻译: 化合物由下式(1)表示,其中R1表示氢原子,甲基或三氟甲基,R2表示亚甲基,亚乙基,1-甲基亚乙基,2-甲基亚乙基, 碳原子数4〜20的二价脂环式烃基或其衍生物,各R3表示碳原子数为4〜20的一价脂环族烃基,其衍生物和具有1个碳原子的直链或支链烷基中的至少一种 至4个碳原子,条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子,并且X表示具有1个碳原子的直链或支链氟亚烷基 至20个碳原子。

    NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION
    5.
    发明申请
    NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION 有权
    新型化合物,聚合物和辐射敏感组合物

    公开(公告)号:US20110104611A1

    公开(公告)日:2011-05-05

    申请号:US12949795

    申请日:2010-11-19

    摘要: A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.

    摘要翻译: 化合物由下式(1)表示,其中R1表示氢原子,甲基或三氟甲基,R2表示亚甲基,亚乙基,1-甲基亚乙基,2-甲基亚乙基, 碳原子数4〜20的二价脂环式烃基或其衍生物,各R3表示碳原子数为4〜20的一价脂环族烃基,其衍生物和具有1个碳原子的直链或支链烷基中的至少一种 至4个碳原子,条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子,并且X表示具有1个碳原子的直链或支链氟亚烷基 至20个碳原子。

    Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer
    7.
    发明授权
    Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer 有权
    辐射敏感性树脂组合物,形成抗蚀剂图案的方法,化合物和聚合物

    公开(公告)号:US08535871B2

    公开(公告)日:2013-09-17

    申请号:US13325056

    申请日:2011-12-14

    IPC分类号: G03F7/039 G03F7/20 G03F7/30

    摘要: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.

    摘要翻译: 辐射敏感性树脂组合物包括第一聚合物,其包含具有酸不稳定基团的重复单元,并且在酸不稳定基团解离时变得碱溶性,并且具有辐射敏感性的酸产生剂。 酸不稳定基具有通式(1)所示的结构。 R1表示甲基等,R2表示形成环状结构的烃基,R3表示氟原子等,R4表示碳原子,n1表示1〜7的整数。