发明授权
US08541529B2 Positive resist composition, method of forming resist pattern, and polymeric compound
有权
正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
- 专利标题： Positive resist composition, method of forming resist pattern, and polymeric compound
- 专利标题（中）： 正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
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申请号： US13454399申请日： 2012-04-24
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公开(公告)号： US08541529B2公开(公告)日： 2013-09-24
- 发明人: Takahiro Dazai , Tomoyuki Hirano , Daiju Shiono , Tasuku Matsumiya
- 申请人： Takahiro Dazai , Tomoyuki Hirano , Daiju Shiono , Tasuku Matsumiya
- 申请人地址： JP Kanagawa-ken
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kanagawa-ken
- 代理机构： Wenderoth, Lind & Ponack, L.L.P.
- 优先权： JPP2008-214688 20080822; JPP2008-285755 20081106; JPP2009-185958 20090810
- 主分类号： C08F20/38
- IPC分类号： C08F20/38 ; C08F28/06 ; G03F7/039
摘要：
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
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