发明授权
- 专利标题: Nitride semiconductor crystal and its production method
- 专利标题(中): 氮化物半导体晶体及其制备方法
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申请号: US12920976申请日: 2009-03-02
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公开(公告)号: US08545626B2公开(公告)日: 2013-10-01
- 发明人: Kenji Fujito , Shuichi Kubo , Yoko Mashige
- 申请人: Kenji Fujito , Shuichi Kubo , Yoko Mashige
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Chemical Corporation
- 当前专利权人: Mitsubishi Chemical Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JPP2008-052587 20080303
- 国际申请: PCT/JP2009/053893 WO 20090302
- 国际公布: WO2009/110436 WO 20090911
- 主分类号: C30B25/02
- IPC分类号: C30B25/02 ; C30B25/00 ; C30B23/00 ; C01B21/06
摘要:
A method for efficiently producing a plate-like nitride semiconductor crystal having the desired principal plane in a simple method is provided. A raw material gas is fed to a seed crystal in which a ratio (L/W) of length L in a longitudinal direction and maximum width W, of a plane of projection obtained by projecting a crystal growth face on the seed crystal in a growth direction is from 2 to 400, and the maximum width W is 5 mm or less, thereby growing a plate-like semiconductor crystal on the seed crystal.
公开/授权文献
- US20110129669A1 NITRIDE SEMICONDUCTOR CRYSTAL AND ITS PRODUCTION METHOD 公开/授权日:2011-06-02
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