发明授权
US08562742B2 Apparatus for radial delivery of gas to a chamber and methods of use thereof
失效
用于将气体径向输送到室的装置及其使用方法
- 专利标题: Apparatus for radial delivery of gas to a chamber and methods of use thereof
- 专利标题(中): 用于将气体径向输送到室的装置及其使用方法
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申请号: US12907947申请日: 2010-10-19
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公开(公告)号: US08562742B2公开(公告)日: 2013-10-22
- 发明人: Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
- 申请人: Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Moser Taboada
- 代理商 Alan Taboada
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; C23C16/455 ; H01L21/3065
摘要:
Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.