公开(公告)号：US08974684B2

公开(公告)日：2015-03-10

申请号：US13458191

申请日：2012-04-27

申请人： Samer Banna ,  Ankur Agarwal

发明人： Samer Banna ,  Ankur Agarwal

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01L21/302 ,  H01L21/461 ,  H01J37/32 ,  H01L21/311

CPC分类号： H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01L21/31116

摘要： Methods for etching a substrate are provided herein. In some embodiments, a method of etching a substrate may include generating a plasma by providing only a first RF signal having a first frequency and a first duty cycle; applying only a second RF signal to bias the plasma towards the substrate, wherein the second RF signal has the first frequency and a second duty cycle different than the first duty cycle; adjusting a phase variance between the first and second RF signals to control an ion energy distribution in the plasma; and etching the substrate with the plasma.

摘要翻译： 本发明提供蚀刻基板的方法。 在一些实施例中，蚀刻衬底的方法可以包括通过仅提供具有第一频率和第一占空比的第一RF信号来产生等离子体; 仅施加第二RF信号以将等离子体偏置到衬底，其中第二RF信号具有与第一占空比不同的第一频率和第二占空比; 调整第一和第二RF信号之间的相位差以控制等离子体中的离子能量分布; 并用等离子体蚀刻衬底。

公开(公告)号：US20130098555A1

公开(公告)日：2013-04-25

申请号：US13595612

申请日：2012-08-27

申请人： Kallol Bera ,  Shahid Rauf ,  Ankur Agarwal

发明人： Kallol Bera ,  Shahid Rauf ,  Ankur Agarwal

IPC分类号： H05H1/46

CPC分类号： H01J37/3233

摘要： In a plasma reactor employing a planar electron beam as a plasma source, the electron beam source chamber has an internal conductive fin that is profiled along a direction transverse to the beam propagation diction and parallel to the plane of the electron beam, in order to correct electron beam density distribution.

摘要翻译： 在采用平面电子束作为等离子体源的等离子体反应器中，电子束源室具有内部导电翅片，该内部导电翅片沿着横向于光束传播的方向并且平行于电子束的平面成型，以便校正 电子束密度分布。

公开(公告)号：US20110265887A1

公开(公告)日：2011-11-03

申请号：US12907947

申请日：2010-10-19

申请人： JARED AHMAD LEE ,  MARTIN JEFF SALINAS ,  ANKUR AGARWAL ,  EZRA ROBERT GOLD ,  JAMES P. CRUSE ,  ANIRUDDHA PAL ,  ANDREW NGUYEN

发明人： JARED AHMAD LEE ,  MARTIN JEFF SALINAS ,  ANKUR AGARWAL ,  EZRA ROBERT GOLD ,  JAMES P. CRUSE ,  ANIRUDDHA PAL ,  ANDREW NGUYEN

IPC分类号： F15D1/00

CPC分类号： H01L21/67017 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/67201 ,  H01L21/68785 ,  Y10T137/6416 ,  Y10T137/8593

摘要： Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.

摘要翻译： 本文提供了将气体输送到室的装置及其使用方法。 在一些实施例中，用于处理室的气体分配系统可以包括主体，其具有构造成将主体连接到处理室的内表面的第一表面，主体具有穿过主体设置的开口; 靠近所述开口的与所述主体的第一表面相对的第一端附近的凸缘，所述凸缘向内延伸到所述开口中并且构造成在其上支撑窗户; 以及多个气体分配通道，其设置在所述主体内并且将设置在所述主体内并且围绕所述开口的通道流体连接到设置在所述凸缘中的多个孔，其中所述多个孔围绕所述凸缘径向设置。

公开(公告)号：US20100248488A1

公开(公告)日：2010-09-30

申请号：US12711061

申请日：2010-02-23

申请人： Ankur Agarwal ,  Kenneth S. Collins ,  Shahid Rauf ,  Kartik Ramaswamy ,  Thorsten B. Lill

发明人： Ankur Agarwal ,  Kenneth S. Collins ,  Shahid Rauf ,  Kartik Ramaswamy ,  Thorsten B. Lill

IPC分类号： H01L21/3065

CPC分类号： H01L21/31116 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32706

摘要： Radial distribution of etch rate is controlled by controlling the respective duty cycles of pulsed VHF source power applied to the ceiling and pulsed HF or MF bias power on the workpiece. Net average electrical charging of the workpiece is controlled by providing an electronegative process gas and controlling the voltage of a positive DC pulse on the workpiece applied during pulse off times of the pulsed VHF source power.

摘要翻译： 通过控制施加到天花板的脉冲VHF源功率和工件上的脉冲HF或MF偏置功率的相应占空比来控制蚀刻速率的径向分布。 通过提供电负性处理气体并控制在脉冲VHF源功率的脉冲关闭期间施加的工件上的正DC脉冲的电压来控制工件的净平均充电。

公开(公告)号：US20080317331A1

公开(公告)日：2008-12-25

申请号：US11765264

申请日：2007-06-19

申请人： John Winn ,  Antonio Criminisi ,  Ankur Agarwal ,  Thomas Deselaers

发明人： John Winn ,  Antonio Criminisi ,  Ankur Agarwal ,  Thomas Deselaers

IPC分类号： G06K9/00

CPC分类号： G06K9/00355 ,  G06F3/017 ,  G06F3/0425 ,  G06K9/6282

摘要： There is a need to provide simple, accurate, fast and computationally inexpensive methods of object and hand pose recognition for many applications. For example, to enable a user to make use of his or her hands to drive an application either displayed on a tablet screen or projected onto a table top. There is also a need to be able to discriminate accurately between events when a user's hand or digit touches such a display from events when a user's hand or digit hovers just above that display. A random decision forest is trained to enable recognition of hand poses and objects and optionally also whether those hand poses are touching or not touching a display surface. The random decision forest uses image features such as appearance, shape and optionally stereo image features. In some cases, the training process is cost aware. The resulting recognition system is operable in real-time.

摘要翻译： 需要为许多应用提供简单，准确，快速和计算上便宜的对象和手姿态识别方法。 例如，为了使用户能够利用他或她的手来驱动显示在平板电脑屏幕上或投影到桌面上的应用程序。 当用户的手或数字在该显示器的正上方移动时，当用户的手或数字触发这样的显示时，还需要能够精确地区分事件之间的事件。 对随机决策林进行训练，以便能够识别手姿势和物体，并且还可以选择地确定那些手姿势是否触及或不接触显示表面。 随机决策林使用图像特征，如外观，形状和可选的立体图像特征。 在某些情况下，培训过程是意识到成本。 所得到的识别系统可以实时操作。

公开(公告)号：US20070077754A1

公开(公告)日：2007-04-05

申请号：US11240468

申请日：2005-10-03

申请人： Minh Ngo ,  Angela Hui ,  Amol Joshi ,  Wenmei Li ,  Ning Cheng ,  Ankur Agarwal ,  Norimitsu Takagi

发明人： Minh Ngo ,  Angela Hui ,  Amol Joshi ,  Wenmei Li ,  Ning Cheng ,  Ankur Agarwal ,  Norimitsu Takagi

IPC分类号： H01L21/4763

CPC分类号： H01L21/76802 ,  H01L21/76831

摘要： A contact structure in a semiconductor device includes a layer of dielectric material and a via formed through the dielectric material. The contact structure further includes a spacer formed on sidewalls of the via using atomic layer deposition (ALD) and a metal deposited in the via.

摘要翻译： 半导体器件中的接触结构包括介电材料层和通过介电材料形成的通孔。 接触结构还包括通过使用原子层沉积（ALD）和沉积在通孔中的金属在通孔的侧壁上形成的间隔物。

公开(公告)号：US08562742B2

公开(公告)日：2013-10-22

申请号：US12907947

申请日：2010-10-19

申请人： Jared Ahmad Lee ,  Martin Jeff Salinas ,  Ankur Agarwal ,  Ezra Robert Gold ,  James P. Cruse ,  Aniruddha Pal ,  Andrew Nguyen

发明人： Jared Ahmad Lee ,  Martin Jeff Salinas ,  Ankur Agarwal ,  Ezra Robert Gold ,  James P. Cruse ,  Aniruddha Pal ,  Andrew Nguyen

IPC分类号： C23C16/00 ,  C23C16/455 ,  H01L21/3065

CPC分类号： H01L21/67017 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/67201 ,  H01L21/68785 ,  Y10T137/6416 ,  Y10T137/8593

摘要： Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.

摘要翻译： 本文提供了将气体输送到室的装置及其使用方法。 在一些实施例中，用于处理室的气体分配系统可以包括主体，其具有构造成将主体连接到处理室的内表面的第一表面，主体具有穿过主体设置的开口; 靠近所述开口的与所述主体的第一表面相对的第一端附近的凸缘，所述凸缘向内延伸到所述开口中并且构造成在其上支撑窗户; 以及多个气体分配通道，其设置在所述主体内并且将设置在所述主体内并且围绕所述开口的通道流体连接到设置在所述凸缘中的多个孔，其中所述多个孔围绕所述凸缘径向设置。

公开(公告)号：US08404598B2

公开(公告)日：2013-03-26

申请号：US12851606

申请日：2010-08-06

申请人： Bryan Liao ,  Katsumasa Kawasaki ,  Yashaswini Pattar ,  Sergio Fukuda Shoji ,  Duy D. Nguyen ,  Kartik Ramaswamy ,  Ankur Agarwal ,  Phillip Stout ,  Shahid Rauf

发明人： Bryan Liao ,  Katsumasa Kawasaki ,  Yashaswini Pattar ,  Sergio Fukuda Shoji ,  Duy D. Nguyen ,  Kartik Ramaswamy ,  Ankur Agarwal ,  Phillip Stout ,  Shahid Rauf

IPC分类号： H01L21/302

CPC分类号： C23F1/00 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32165 ,  H01L21/31116

摘要： Methods for processing a substrate are provided herein. In some embodiments, a method of etching a dielectric layer includes generating a plasma by pulsing a first RF source signal having a first duty cycle; applying a second RF bias signal having a second duty cycle to the plasma; applying a third RF bias signal having a third duty cycle to the plasma, wherein the first, second, and third signals are synchronized; adjusting a phase variance between the first RF source signal and at least one of the second or third RF bias signals to control at least one of plasma ion density non-uniformity in the plasma or charge build-up on the dielectric layer; and etching the dielectric layer with the plasma.

公开(公告)号：US20120162354A1

公开(公告)日：2012-06-28

申请号：US13406235

申请日：2012-02-27

申请人： Ankur Agarwal ,  Antonio Criminisi ,  William Buxton ,  Andrew Blake ,  Andrew Fitzgibbon

发明人： Ankur Agarwal ,  Antonio Criminisi ,  William Buxton ,  Andrew Blake ,  Andrew Fitzgibbon

IPC分类号： H04N7/15

CPC分类号： G06Q10/10 ,  H04N7/15

摘要： Existing remote workspace sharing systems are difficult to use. For example, changes made on a common work product by one user often appear abruptly on displays viewed by remote users. As a result the interaction is perceived as unnatural by the users and is often inefficient. Images of a display of a common work product are received from a camera at a first location. These images may also comprise information about objects between the display and the camera such as a user's hand editing a document on a tablet PC. These images are combined with images of the shared work product and displayed at remote locations. Advance information about remote user actions is then visible and facilitates collaborative mediation between users. Depth information may be used to influence the process of combining the images.

摘要翻译： 现有的远程工作区共享系统很难使用。 例如，一个用户在公共工作产品上进行的更改通常会在远程用户查看的显示器上突然出现。 因此，互动被用户认为是不自然的，并且通常效率低下。 在第一位置从相机接收公共作品的显示的图像。 这些图像还可以包括关于显示器和相机之间的对象的信息，例如用户在平板PC上编辑文档的手。 这些图像与共享工作产品的图像组合，并在远程位置显示。 然后可以看到有关远程用户操作的高级信息，并促进用户之间的协作中介。 深度信息可以用于影响组合图像的过程。

公开(公告)号：US08125510B2

公开(公告)日：2012-02-28

申请号：US11669107

申请日：2007-01-30

申请人： Ankur Agarwal ,  Antonio Criminisi ,  Bill Buxton ,  Andrew Blake ,  Andrew Fitzgibbon

发明人： Ankur Agarwal ,  Antonio Criminisi ,  Bill Buxton ,  Andrew Blake ,  Andrew Fitzgibbon

IPC分类号： H04N7/14

CPC分类号： G06Q10/10 ,  H04N7/15

摘要： Existing remote workspace sharing systems are difficult to use. For example, changes made on a common work product by one user often appear abruptly on displays viewed by remote users. As a result the interaction is perceived as unnatural by the users and is often inefficient. Images of a display of a common work product are received from a camera at a first location. These images may also comprise information about objects between the display and the camera such as a user's hand editing a document on a tablet PC. These images are combined with images of the shared work product and displayed at remote locations. Advance information about remote user actions is then visible and facilitates collaborative mediation between users. Depth information may be used to influence the process of combining the images.

摘要翻译： 现有的远程工作区共享系统很难使用。 例如，一个用户在公共工作产品上进行的更改通常会在远程用户查看的显示器上突然出现。 因此，互动被用户认为是不自然的，并且通常效率低下。 在第一位置从相机接收公共作品的显示的图像。 这些图像还可以包括关于显示器和相机之间的对象的信息，例如用户在平板PC上编辑文档的手。 这些图像与共享工作产品的图像组合，并在远程位置显示。 然后可以看到有关远程用户操作的高级信息，并促进用户之间的协作中介。 深度信息可以用于影响组合图像的过程。