Invention Grant
- Patent Title: Semiconductor devices and methods of fabricating the same
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US13868752Application Date: 2013-04-23
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Publication No.: US08563390B2Publication Date: 2013-10-22
- Inventor: Myoungsoo Kim , Yoonkyung Choi , Eun Young Lee , Sungil Jo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2010-0019541 20100304
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L27/108 ; H01L29/94

Abstract:
A semiconductor device includes capacitors connected in parallel. Electrode active portions and a discharge active portion are defined on a semiconductor substrate, and capping electrodes are disposed respectively on the electrode active portions. A capacitor-dielectric layer is disposed between each of the capping electrodes and each of the electrode active portions that overlap each other. A counter doped region is disposed in the discharge active portion. A lower interlayer dielectric covers the entire surface of the semiconductor substrate. Electrode contact plugs respectively contact the capping electrodes through the lower interlayer dielectric, and a discharge contact plug contacts the counter doped region through the lower interlayer dielectric. A lower interconnection is disposed on the lower interlayer dielectric and contacts the electrode contact plugs and the discharge contact plug.
Public/Granted literature
- US20130230963A1 Semiconductor Devices and Methods of Fabricating the Same Public/Granted day:2013-09-05
Information query
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