发明授权
- 专利标题： Showerhead electrode
- 专利标题（中）： 喷头电极
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申请号： US12875869申请日： 2010-09-03
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公开(公告)号： US08573152B2公开(公告)日： 2013-11-05
- 发明人: Anthony de la Llera , Pratik Mankidy , Michael C. Kellogg , Rajinder Dhindsa
- 申请人： Anthony de la Llera , Pratik Mankidy , Michael C. Kellogg , Rajinder Dhindsa
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Buchanan Ingersoll & Rooney PC
- 主分类号： C23C16/455
- IPC分类号： C23C16/455 ; C23C16/505 ; C23C16/509 ; B23P19/00 ; C23F1/00 ; H01L21/306 ; C23C16/06 ; C23C16/22
摘要：
A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.
公开/授权文献
- US20120055632A1 SHOWERHEAD ELECTRODE 公开/授权日：2012-03-08
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