Cam-locked showerhead electrode and assembly
    2.
    发明授权
    Cam-locked showerhead electrode and assembly 有权
    凸轮锁定淋浴电极和组件

    公开(公告)号:US08470127B2

    公开(公告)日:2013-06-25

    申请号:US12985568

    申请日:2011-01-06

    IPC分类号: C23C16/00 H01L21/00

    摘要: A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.

    摘要翻译: 用于等离子体蚀刻的喷头电极和组件包括提供喷头电极和背板之间改进的热接触的凸轮锁。 凸轮锁包括背板中的凸轮轴,其接合安装在喷头电极上的螺柱的扩大头部。 组件可以包括围绕喷头电极的环形护罩,并且背板中的八个凸轮轴可以被操作,使得每个凸轮轴同时接合环形护罩上的螺柱和喷头电极的外排螺柱中的螺柱 。 可以操作另外八个凸轮轴,使得每个凸轮轴接合在喷头电极安装的螺柱的内部和中间行上的一对螺柱。

    ELECTROSTATIC CHUCK WITH AN ANGLED SIDEWALL
    4.
    发明申请
    ELECTROSTATIC CHUCK WITH AN ANGLED SIDEWALL 审中-公开
    带静电门的静电卡盘

    公开(公告)号:US20110126852A1

    公开(公告)日:2011-06-02

    申请号:US12956727

    申请日:2010-11-30

    IPC分类号: B08B7/00 H01L21/3065

    摘要: A substrate support for a plasma processing chamber has an angled sidewall at an upper periphery thereof. The substrate is surrounded by an edge ring which underlies a substrate supported on an upper substrate support surface of the substrate support during plasma processing. The angled sidewall is the only surface of the substrate support exposed and subject to byproduct deposition during plasma processing. The angled sidewall enhances sputtering rate of the byproduct deposition during an in situ chamber clean process wherein a cleaning gas supplied to the chamber is energized into a plasma state for cleaning the byproduct deposition.

    摘要翻译: 用于等离子体处理室的衬底支撑件在其上周边具有成角度的侧壁。 基板被等离子体处理期间由支撑在基板支撑件的上基板支撑表面上的基板的下方的边缘环包围。 成角度的侧壁是暴露于等离子体处理期间受副产物沉积的基板支架的唯一表面。 成角度的侧壁在原位室清洁过程期间增强副产物沉积的溅射速率,其中供应到室的清洁气体被激发到等离子体状态以清洁副产物沉积。

    CAM-LOCKED SHOWERHEAD ELECTRODE AND ASSEMBLY
    8.
    发明申请
    CAM-LOCKED SHOWERHEAD ELECTRODE AND ASSEMBLY 有权
    CAM锁住的淋浴电极和组件

    公开(公告)号:US20120175062A1

    公开(公告)日:2012-07-12

    申请号:US12985568

    申请日:2011-01-06

    IPC分类号: C23C16/50 C23F1/08 C23C16/455

    摘要: A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.

    摘要翻译: 用于等离子体蚀刻的喷头电极和组件包括提供喷头电极和背板之间改进的热接触的凸轮锁。 凸轮锁包括背板中的凸轮轴,其接合安装在喷头电极上的螺柱的扩大头部。 组件可以包括围绕喷头电极的环形护罩,并且背板中的八个凸轮轴可以被操作,使得每个凸轮轴同时接合环形护罩上的螺柱和喷头电极的外排螺柱中的螺柱 。 可以操作另外八个凸轮轴,使得每个凸轮轴接合在喷头电极安装的螺柱的内部和中间行上的一对螺柱。

    SHOWERHEAD ELECTRODE
    9.
    发明申请
    SHOWERHEAD ELECTRODE 有权
    淋浴电极

    公开(公告)号:US20120055632A1

    公开(公告)日:2012-03-08

    申请号:US12875869

    申请日:2010-09-03

    CPC分类号: H01R13/20

    摘要: A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.

    摘要翻译: 在用于蚀刻半导体衬底的等离子体反应室中的喷头电极,垫圈组件及其组件设置有改进的气体注入孔图案,定位精度和减小的翘曲,这导致等离子体处理速率的均匀性提高。 将内部电极和垫圈组装在支撑构件上的方法包括凸轮锁的同时接合。