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发明授权
US08573153B2 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode 有权
用于半导体处理等离子体反应器的多部分电极和替换多部分电极的一部分的方法

Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
摘要：
An improved upper electrode system has a multi-part electrode in which a central portion of the electrode having high wear is replaceable independent of an outer peripheral portion of the electrode. The upper electrode can be used in plasma processing systems for processing semiconductor substrates, such as by etching or CVD. The multi-part upper electrode system is particularly useful for large size wafer processing chambers, such as 300 mm wafer processing chambers for which monolithic electrodes are unavailable or costly.
摘要（中）：

改进的上电极系统具有多部分电极，其中具有高磨损的电极的中心部分可以独立于电极的外周部分进行替换。 上电极可用于等离子体处理系统中，例如通过蚀刻或CVD来处理半导体衬底。 多部分上电极系统对于大尺寸晶片处理室是特别有用的，例如用于单片电极不可用或成本高的300mm晶片处理室。

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