发明授权
- 专利标题： Plasma confinement apparatus, and method for confining a plasma
- 专利标题（中）： 等离子体封隔装置和限制等离子体的方法
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申请号： US11546041申请日： 2006-10-10
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公开(公告)号： US08608851B2公开(公告)日： 2013-12-17
- 发明人: Tom Ni , Jinyuan Chen , Qing Qian , Yuehong Fu , Zhaoyang Xu , Xusheng Zhou , Ye Wang
- 申请人： Tom Ni , Jinyuan Chen , Qing Qian , Yuehong Fu , Zhaoyang Xu , Xusheng Zhou , Ye Wang
- 申请人地址： KY George Town, Grand Cayman
- 专利权人： Advanced Micro-Fabrication Equipment, Inc. Asia
- 当前专利权人： Advanced Micro-Fabrication Equipment, Inc. Asia
- 当前专利权人地址： KY George Town, Grand Cayman
- 代理机构： Nixon Peabody LLP
- 代理商 Joseph Bach, Esq.
- 优先权： CN200510030576 20051014; CN200610116449 20060922
- 主分类号： C23C16/00
- IPC分类号： C23C16/00
摘要：
A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.