发明授权
- 专利标题： Edge termination structure employing recesses for edge termination elements
- 专利标题（中）： 边缘终端结构采用边缘终端元件的凹槽
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申请号： US13229750申请日： 2011-09-11
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公开(公告)号： US08618582B2公开(公告)日： 2013-12-31
- 发明人: Jason Patrick Henning , Qingchun Zhang , Sei-Hyung Ryu , Anant Agarwal , John Williams Palmour , Scott Allen
- 申请人： Jason Patrick Henning , Qingchun Zhang , Sei-Hyung Ryu , Anant Agarwal , John Williams Palmour , Scott Allen
- 申请人地址： US NC Durham
- 专利权人： Cree, Inc.
- 当前专利权人： Cree, Inc.
- 当前专利权人地址： US NC Durham
- 代理机构： Withrow & Terranova, P.L.L.C.
- 主分类号： H01L29/66
- IPC分类号： H01L29/66
摘要：
Elements of an edge termination structure, such as multiple concentric guard rings, are effectively doped regions in a drift layer. To increase the depth of these doped regions, individual recesses may be formed in a surface of the drift layer where the elements of the edge termination structure are to be formed. Once the recesses are formed in the drift layer, these areas about and at the bottom of the recesses are doped to form the respective edge termination elements.