Schottky diode employing recesses for elements of junction barrier array
    6.
    发明授权
    Schottky diode employing recesses for elements of junction barrier array 有权
    肖特基二极管采用连接屏障阵列元件的凹槽

    公开(公告)号:US08664665B2

    公开(公告)日:2014-03-04

    申请号:US13229752

    申请日:2011-09-11

    IPC分类号: H01L29/15

    摘要: The present disclosure generally relates to a Schottky diode that has a substrate, a drift layer provided over the substrate, and a Schottky layer provided over an active region of the substrate. A junction barrier array is provided in the drift layer just below the Schottky layer. The elements of the junction barrier array are generally doped regions in the drift layer. To increase the depth of these doped regions, individual recesses may be formed in the surface of the drift layer where the elements of the junction barrier array are to be formed. Once the recesses are formed in the drift layer, areas about and at the bottom of the recesses are doped to form the respective elements of the junction barrier array.

    摘要翻译: 本发明一般涉及一种肖特基二极管,其具有衬底,设置在衬底上的漂移层以及设置在衬底的有源区上的肖特基层。 在位于肖特基层正下方的漂移层中提供了结屏障阵列。 结势垒阵列的元件通常是漂移层中的掺杂区域。 为了增加这些掺杂区域的深度,可以在要形成结屏障阵列的元件的漂移层的表面中形成单独的凹槽。 一旦凹陷形成在漂移层中,则凹部周围和底部的区域被掺杂以形成连接屏障阵列的相应元件。