发明授权
- 专利标题： Deposition method, deposition film, and method for producing organic electroluminescence display device
- 专利标题（中）： 沉积方法，沉积膜和制备有机电致发光显示装置的方法
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申请号： US13976011申请日： 2011-12-20
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公开(公告)号： US08664023B2公开(公告)日： 2014-03-04
- 发明人: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- 申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- 申请人地址： JP Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 代理机构： Morrison & Foerster LLP
- 优先权： JP2010-291203 20101227
- 国际申请： PCT/JP2011/079453 WO 20111220
- 国际公布： WO2012/090777 WO 20120705
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/40 ; H01L51/40
摘要：
A vapor deposition method of the present invention includes the steps of (i) preparing a mask unit including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other, (ii) while moving at least one of the mask unit and the film formation substrate (200) relative to the other, depositing a vapor deposition flow, emitted from the vapor deposition source (85), onto a vapor deposition region (210), and (iii) adjusting the position of a second shutter (111) so that the second shutter (111) blocks a vapor deposition flow traveling toward the vapor deposition unnecessary region (210).
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