发明授权
US08664665B2 Schottky diode employing recesses for elements of junction barrier array
有权
肖特基二极管采用连接屏障阵列元件的凹槽
- 专利标题: Schottky diode employing recesses for elements of junction barrier array
- 专利标题(中): 肖特基二极管采用连接屏障阵列元件的凹槽
-
申请号: US13229752申请日: 2011-09-11
-
公开(公告)号: US08664665B2公开(公告)日: 2014-03-04
- 发明人: Jason Patrick Henning , Qingchun Zhang , Sei-Hyung Ryu , Anant Agarwal , John Williams Palmour , Scott Allen
- 申请人: Jason Patrick Henning , Qingchun Zhang , Sei-Hyung Ryu , Anant Agarwal , John Williams Palmour , Scott Allen
- 申请人地址: US NC Durham
- 专利权人: Cree, Inc.
- 当前专利权人: Cree, Inc.
- 当前专利权人地址: US NC Durham
- 代理机构: Withrow & Terranova, P.L.L.C.
- 主分类号: H01L29/15
- IPC分类号: H01L29/15
摘要:
The present disclosure generally relates to a Schottky diode that has a substrate, a drift layer provided over the substrate, and a Schottky layer provided over an active region of the substrate. A junction barrier array is provided in the drift layer just below the Schottky layer. The elements of the junction barrier array are generally doped regions in the drift layer. To increase the depth of these doped regions, individual recesses may be formed in the surface of the drift layer where the elements of the junction barrier array are to be formed. Once the recesses are formed in the drift layer, areas about and at the bottom of the recesses are doped to form the respective elements of the junction barrier array.
公开/授权文献
信息查询
IPC分类: