Invention Grant
- Patent Title: Method of recovering film-forming material
- Patent Title (中): 回收成膜材料的方法
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Application No.: US13996515Application Date: 2011-12-16
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Publication No.: US08668157B2Publication Date: 2014-03-11
- Inventor: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2010-286821 20101223
- International Application: PCT/JP2011/079151 WO 20111216
- International Announcement: WO2012/086535 WO 20120628
- Main IPC: B02C19/00
- IPC: B02C19/00 ; B24B1/00

Abstract:
A layer (71), made from a material that is attracted by a magnet, is formed in at least part of a chamber component (70), which at least part makes in contact with a film forming material. A method for collecting a film forming material includes the steps of: (a) exfoliating an attachment (22) which has attached to a surface of the chamber component (70); and (b) collecting the attachment (22) by separating a fragment of the layer (71), which fragment has been exfoliated in the step (a), while causing the fragment to be attracted by a magnet (202a).
Public/Granted literature
- US20130292501A1 METHOD OF RECOVERING FILM-FORMING MATERIAL Public/Granted day:2013-11-07
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