Invention Grant
US08668956B2 Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method 有权
气相沉积粒子发射装置,气相沉积装置,气相沉积法

Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method
Abstract:
A vapor deposition particle injection device (30) includes a vapor deposition particle generating section (41), at least one nozzle stage made of an intermediate nozzle section (51), a vapor deposition particle emitting nozzle section (61), and heat exchangers (43, 63, 53). The vapor deposition particle emitting nozzle section (61) is controlled so as to be at a temperature lower than a temperature at which a vapor deposition material turns into gas. Meanwhile, the intermediate nozzle section (51) is controlled by the heat exchanger (53) so as to be at a temperature between a temperature of the vapor deposition particle generating section (41) and a temperature of the vapor deposition particle emitting nozzle section (61).
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