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126 条记录 (耗时 0.042 秒)

    DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE
    2.
    发明申请
    DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE 审中-公开
    沉积颗粒发射装置，沉积颗粒排放方法和沉积装置

    公开(公告)号：US20140014036A1

    公开(公告)日：2014-01-16

    申请号：US14007956

    申请日：2012-03-23

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L21/02 ,  B65D85/00

    摘要： A vapor deposition particle emitting device of the present invention includes: a nozzle section (110) having emission holes (111) from which gaseous vapor deposition particles are emitted out; a heating plate unit (100), provided in the nozzle section (110), which is made up of heating plates (101) each having a surface on which a vapor deposition material remains as a result of adherence of vapor deposition particles to the surface; and a heating device (160) for heating the vapor deposition material, which is thus remaining on the surface of each of the heating plates (101), so that a temperature of the vapor deposition material is not less than a temperature at which to become transformed into gaseous form.

    摘要翻译： 本发明的气相沉积粒子发射装置包括：喷嘴部分（110），其具有从其中排出气态气相沉积颗粒的发射孔（111）; 设置在所述喷嘴部分（110）中的加热板单元（100），所述加热板单元由加热板（101）组成，所述加热板具有由于气相沉积颗粒粘附到所述表面而具有气相沉积材料的表面的表面 ; 以及用于加热蒸镀材料的加热装置（160），其被保持在每个加热板（101）的表面上，使得蒸镀材料的温度不低于成为 转化成气态。

    VAPOR DEPOSITION PARTICLE PROJECTION DEVICE AND VAPOR DEPOSITION DEVICE
    3.
    发明申请
    VAPOR DEPOSITION PARTICLE PROJECTION DEVICE AND VAPOR DEPOSITION DEVICE 审中-公开
    蒸气沉积颗粒投影装置和蒸气沉积装置

    公开(公告)号：US20130319331A1

    公开(公告)日：2013-12-05

    申请号：US13985854

    申请日：2012-03-08

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L51/56

    CPC分类号： H01L51/56 ,  C23C14/243 ,  C23C14/26 ,  C23C14/542 ,  C23C14/562 ,  H01L51/0008

    摘要： A vapor deposition particle injection device (501) of the present invention includes: vapor deposition particle generating sections (110) and (120) for generating vapor deposition particles in the form of vapor by heating vapor deposition materials (114) and (124); and a nozzle section (170) which (i) is connected to the vapor deposition particle generating sections (110) and (120) and (ii) has an injection hole (171) from which the vapor deposition particles generated by the vapor deposition particle generating sections (110) and (120) are injected outward. The vapor deposition particle generating section (120) has a smaller capacity for the vapor deposition material than the vapor deposition particle generating section (110).

    摘要翻译： 本发明的气相沉积粒子注入装置（501）包括：通过加热气相沉积材料（114）和（124）产生汽相形式的气相沉积颗粒的气相沉积颗粒产生部分（110）和（120） 和（i）连接到气相沉积颗粒产生部分（110）和（120）的喷嘴部分（170）和（ii）具有喷射孔（171），由气相沉积颗粒产生的气相沉积颗粒 产生部分（110）和（120）向外注入。 气相沉积粒子产生部分（120）具有比气相沉积粒子产生部分（110）更小的气相沉积材料的能力。

    METHOD OF RECOVERING FILM-FORMING MATERIAL
    5.
    发明申请
    METHOD OF RECOVERING FILM-FORMING MATERIAL 有权
    回收成膜材料的方法

    公开(公告)号：US20130292501A1

    公开(公告)日：2013-11-07

    申请号：US13996515

    申请日：2011-12-16

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： B03C1/005

    CPC分类号： B03C1/005 ,  B03C1/30 ,  B03C2201/20 ,  C23C14/12 ,  C23C14/564 ,  H01L51/0016

    摘要： A layer (71), made from a material that is attracted by a magnet, is formed in at least part of a chamber component (70), which at least part makes in contact with a film forming material. A method for collecting a film forming material includes the steps of: (a) exfoliating an attachment (22) which has attached to a surface of the chamber component (70); and (b) collecting the attachment (22) by separating a fragment of the layer (71), which fragment has been exfoliated in the step (a), while causing the fragment to be attracted by a magnet (202a).

    摘要翻译： 在由至少部分与成膜材料接触的室部件（70）的至少一部分中形成由被磁体吸引的材料制成的层（71）。 收集成膜材料的方法包括以下步骤：（a）剥离附着在室部件（70）的表面上的附件（22）; 和（b）通过在片段被磁体（202a）吸引的同时分离在步骤（a）中剥离的片段的片段（71）来收集附件（22）。

    DEPOSITION METHOD, DEPOSITION FILM, AND METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE
    6.
    发明申请
    DEPOSITION METHOD, DEPOSITION FILM, AND METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE 有权
    沉积方法，沉积膜和用于生产有机电致发光显示器件的方法

    公开(公告)号：US20130273679A1

    公开(公告)日：2013-10-17

    申请号：US13976011

    申请日：2011-12-20

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L51/00

    CPC分类号： H01L51/0011 ,  C23C14/042 ,  C23C14/12 ,  H01L51/0008

    摘要： A vapor deposition method of the present invention includes the steps of (i) preparing a mask unit including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other, (ii) while moving at least one of the mask unit and the film formation substrate (200) relative to the other, depositing a vapor deposition flow, emitted from the vapor deposition source (85), onto a vapor deposition region (210), and (iii) adjusting the position of a second shutter (111) so that the second shutter (111) blocks a vapor deposition flow traveling toward the vapor deposition unnecessary region (210).

    摘要翻译： 本发明的气相沉积方法包括以下步骤：（i）制备掩模单元，其包括荫罩（81）和相对于彼此固定的位置的气相沉积源（85），（ii）在移动至少一个 的掩模单元和成膜基板（200）相对于另一方形成，从蒸镀源（85）排出的气相沉积流沉积在蒸镀区域（210）上，（iii） 第二挡板（111），使得所述第二挡板（111）阻挡向所述气相沉积不需要区域（210）行进的气相沉积流。

    Display substrate, organic electroluminescent display device, and manufacturing method for display substrate and organic electroluminescent display device
    8.
    发明授权
    Display substrate, organic electroluminescent display device, and manufacturing method for display substrate and organic electroluminescent display device 有权
    显示基板，有机电致发光显示装置以及显示基板和有机电致发光显示装置的制造方法

    公开(公告)号：US09299946B2

    公开(公告)日：2016-03-29

    申请号：US14008535

    申请日：2012-03-27

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L33/14 ,  H01L51/50 ,  H05B33/14 ,  H01L51/56 ,  H01L27/32 ,  H01L51/52

    CPC分类号： H01L51/504 ,  H01L27/3213 ,  H01L27/3218 ,  H01L27/3244 ,  H01L51/5265 ,  H01L51/56 ,  H05B33/145

    摘要： TFT substrate (10) includes a plurality of pixel regions each including light emitting regions of at least three colors, which light emitting regions include light emitting layers (23R(1), 23G, 23R(2), and 23B), respectively, and two adjacent ones of the light emitting regions are a combination other than a combination of (i) a light emitting region included in a light emitting layer (23G) of a color having a highest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance and (ii) a light emitting region included in a light emitting layer (23B) of a color having a lowest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance.

    摘要翻译： TFT基板（10）包括分别包括至少三种颜色的发光区域的多个像素区域，该发光区域分别包括发光层（23R（1），23G，23R（2）和23B），以及 两个相邻的发光区域是除了（i）包含在发光层（23G）中的发光区域的组合之外的组合，在发光层的发光层的情况下具有最高电流效率的颜色 所述至少三种颜色的发光区域发射具有相同亮度的光，以及（ii）包含在具有最低电流效率的颜色的发光层（23B）中的发光区域，在发光层的发光层 至少三种颜色的发光区域发射具有相同亮度的光。

    Vapor deposition device, vapor deposition method, and organic EL display device
    9.
    发明授权
    Vapor deposition device, vapor deposition method, and organic EL display device 有权
    气相沉积装置，气相沉积法和有机EL显示装置

    公开(公告)号：US09240572B2

    公开(公告)日：2016-01-19

    申请号：US13984799

    申请日：2012-03-02

    申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

    发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

    IPC分类号： H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  C23C14/56 ,  C23C16/455 ,  H01L51/00

    CPC分类号： H01L51/56 ,  C23C14/044 ,  C23C14/12 ,  C23C14/562 ,  C23C16/45578 ,  H01L51/0011

    摘要： A vapor deposition device includes a vapor deposition source (60) having a plurality of vapor deposition source openings (61) that discharge vapor deposition particles (91), a limiting unit (80) having a plurality of limiting openings (82), and a vapor deposition mask (70) in which a plurality of mask openings (71) are formed only in a plurality of vapor deposition regions (72) where the vapor deposition particles that have passed through a plurality of limiting openings reach. The plurality of vapor deposition regions are arranged along a second direction that is orthogonal to the normal line direction of the substrate (10) and the movement direction of the substrate, with non-vapor deposition regions (73) where the vapor deposition particles do not reach being sandwiched therebetween. Mask openings through which the vapor deposition particles pass are formed at different positions in the movement direction of the substrate from the positions of the non-vapor deposition regions located on a straight line parallel to the second direction, as viewed along the normal line direction of the substrate. Accordingly, it is possible to stably form a vapor deposition coating film in which edge blurring is suppressed at a desired position on a substrate.

    摘要翻译： 蒸镀装置包括：蒸镀源（60），具有排出气相沉积粒子（91）的多个气相沉积源开口（61），具有多个限制开口（82）的限制单元（80） 气相沉积掩模（70），其中多个掩模开口（71）仅形成在已经通过多个限制孔的气相沉积颗粒到达的多个气相沉积区（72）中。 多个气相沉积区域沿着与基板（10）的法线方向正交的第二方向和基板的移动方向排列，其中气相沉积微粒不具有非气相沉积区域（73） 夹在其间。 沿着平行于第二方向的直线上的非蒸镀区域的位置，沿着基板的移动方向的不同位置，沿蒸镀粒子的法线方向 底物。 因此，可以稳定地形成在基板上的期望位置抑制边缘模糊的气相沉积涂膜。