发明授权
- 专利标题: Method of assembling two integrated circuits and corresponding structure
- 专利标题(中): 组装两个集成电路及相应结构的方法
-
申请号: US13328175申请日: 2011-12-16
-
公开(公告)号: US08674517B2公开(公告)日: 2014-03-18
- 发明人: Laurent-Luc Chapelon , Mohamed Bouchoucha
- 申请人: Laurent-Luc Chapelon , Mohamed Bouchoucha
- 申请人地址: FR Crolles
- 专利权人: STMicroelectronics (Crolles 2) SAS
- 当前专利权人: STMicroelectronics (Crolles 2) SAS
- 当前专利权人地址: FR Crolles
- 代理机构: Allen, Dyer, Doppelt, Milbrath & Gilchrist, P.A.
- 优先权: FR1060637 20101216
- 主分类号: H01L23/488
- IPC分类号: H01L23/488 ; H01L21/50
摘要:
A semiconductor device includes an assembly of two integrated circuits. The assembly has a layer of photoresist filling the space between the two integrated circuits, and at least one electrically conducting pillar within the resist and electrically coupling the two integrated circuits.
公开/授权文献
信息查询
IPC分类: