发明授权
US08704998B2 Lithographic apparatus and device manufacturing method involving a barrier to collect liquid
有权
平版印刷设备和装置制造方法涉及到采集液体的屏障
- 专利标题： Lithographic apparatus and device manufacturing method involving a barrier to collect liquid
- 专利标题（中）： 平版印刷设备和装置制造方法涉及到采集液体的屏障
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申请号： US13012303申请日： 2011-01-24
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公开(公告)号： US08704998B2公开(公告)日： 2014-04-22
- 发明人: Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
- 申请人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/32
摘要：
A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
公开/授权文献
- US20110116061A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2011-05-19
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