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    Lithographic apparatus and device manufacturing method
    7.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07582881B2

    公开(公告)日：2009-09-01

    申请号：US11902857

    申请日：2007-09-26

    申请人： Franciscus Johannes Herman Maria Teunissen ,  Raymond Charles Carnahan

    发明人： Franciscus Johannes Herman Maria Teunissen ,  Raymond Charles Carnahan

    IPC分类号： G01N21/00

    CPC分类号： B01J39/04 ,  C02F1/42 ,  G03F7/70341 ,  G03F7/70925

    摘要： A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon dioxide, are placed in series along a conduit containing the liquid for use in an immersion lithographic apparatus. The upstream polisher absorbs carbon dioxide and silicon dioxide until it is saturated, at which point it desorbs the silicon dioxide in preference for the carbon dioxide. Silicon dioxide continues down the conduit and is absorbed by the downstream polisher. Once the upstream polisher is saturated with carbon dioxide, carbon dioxide present in the liquid flows downstream where it is absorbed by the downstream polisher. A sensor between the polishers senses the presence of carbon dioxide and initiates a request for the one or more of polishers to be cleaned or replaced.

    摘要翻译： 公开了一种用于监测液体中二氧化硅水平并使用抛光机去除二氧化硅的方法和装置。 在一个实施方案中，吸收二氧化碳和二氧化硅但是对二氧化碳具有更大亲合力的两个抛光机沿着包含用于浸没式光刻设备的液体的导管串联放置。 上游抛光机吸收二氧化碳和二氧化硅直到其饱和，此时它优先于二氧化碳解吸二氧化硅。 二氧化硅继续向下导管并被下游抛光机吸收。 一旦上游抛光机饱和二氧化碳，液体中存在的二氧化碳就会流向下游，被下游抛光机吸收。 抛光机之间的传感器感测二氧化碳的存在，并启动对一个或多个抛光机进行清洁或更换的请求。