Invention Grant
- Patent Title: Fabrication method for functional surface
- Patent Title (中): 功能表面的制作方法
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Application No.: US12845233Application Date: 2010-07-28
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Publication No.: US08728571B2Publication Date: 2014-05-20
- Inventor: Hyuneui Lim , Seungmuk Ji , Jun-Hee Lee , Wan-Doo Kim
- Applicant: Hyuneui Lim , Seungmuk Ji , Jun-Hee Lee , Wan-Doo Kim
- Applicant Address: KR
- Assignee: Korea Institute of Machinery and Materials
- Current Assignee: Korea Institute of Machinery and Materials
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2009-0069292 20090729
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/02 ; C23C16/26 ; C23C16/40 ; B05D5/08

Abstract:
Provided is a fabrication method for a functional surface that has self-cleaning ability and superhydrophilic anti-reflective property, which includes a) arranging a plurality of beads having a sphere shape on a surface of a transparent substrate; b) forming a predetermined inter-bead gap by etching the plurality of beads; c) forming a surface unevenness on the surface of the substrate by etching the substrate using the plurality of the beads having the predetermined gap as an etching mask; d) removing the plurality of the beads from the surface of the substrate; and e) forming a photocatalytic layer or a compound layer having a surface tension of 18 to 28 N/m on the surface of the substrate formed with the surface unevenness.
Public/Granted literature
- US20110028305A1 FABRICATION METHOD FOR FUNCTIONAL SURFACE Public/Granted day:2011-02-03
Information query
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