Invention Grant
- Patent Title: Coating and developing apparatus
- Patent Title (中): 涂装显影装置
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Application No.: US13967485Application Date: 2013-08-15
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Publication No.: US08740481B2Publication Date: 2014-06-03
- Inventor: Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JP2010-156563 20100709; JP2011-053370 20110310
- Main IPC: G03D5/00
- IPC: G03D5/00 ; G03B27/52 ; B05C11/02 ; B05C13/02 ; G03F7/20 ; H01L21/67

Abstract:
A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.
Public/Granted literature
- US20130329199A1 COATING AND DEVELOPING APPARATUS Public/Granted day:2013-12-12
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