发明授权
- 专利标题: Fast nanoimprinting apparatus using deformale mold
- 专利标题(中): 使用变形模具的快速纳米压印装置
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申请号: US13011844申请日: 2011-01-21
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公开(公告)号: US08747092B2公开(公告)日: 2014-06-10
- 发明人: Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
- 申请人: Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
- 申请人地址: US NJ Monmouth Junction
- 专利权人: Nanonex Corporation
- 当前专利权人: Nanonex Corporation
- 当前专利权人地址: US NJ Monmouth Junction
- 代理机构: Polster Lieder
- 主分类号: B29C59/16
- IPC分类号: B29C59/16 ; B29C70/44 ; B29C35/08 ; B29C43/10
摘要:
The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere. The substrate and mold may be pressed further by introducing higher pressure inside the chamber. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
公开/授权文献
- US20110180965A1 FAST NANOIMPRINTING APPARATUS USING DEFORMALE MOLD 公开/授权日:2011-07-28
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