Invention Grant
US08765252B2 Thin film device with minimized spatial variation of local mean height
有权
薄膜器件具有最小的局部平均高度的空间变化
- Patent Title: Thin film device with minimized spatial variation of local mean height
- Patent Title (中): 薄膜器件具有最小的局部平均高度的空间变化
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Application No.: US11948867Application Date: 2007-11-30
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Publication No.: US08765252B2Publication Date: 2014-07-01
- Inventor: Warren Jackson , Carl P. Taussig , Ping Mei , Albert Jeans , Han-Jun Kim
- Applicant: Warren Jackson , Carl P. Taussig , Ping Mei , Albert Jeans , Han-Jun Kim
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: B32B7/02
- IPC: B32B7/02 ; B82Y10/00 ; B82Y40/00 ; G03F7/00

Abstract:
This invention provides a thin film device with minimized spatial variation of local mean height. More specifically, the thin film device has a substrate and at least one first structure having a first spatially varying weighted local mean height determined by a layer weighting function. The first structure has a first maximum height, a first minimum height and a first variation for a given averaging area. A compensation structure is also provided upon the substrate, the compensation structure having a second spatially varying weighted local mean height determined by the layer weighting function. The compensation structure also has a second maximum height, a second minimum height and a second variation for the given averaging area. The first structure and compensation structure combine to provide a combined structure upon the substrate with minimized spatial variation of a combined weighted local mean.
Public/Granted literature
- US20090142560A1 THIN FILM DEVICE WITH MINIMIZED SPATIAL VARIATION OF LOCAL MEAN HEIGHT Public/Granted day:2009-06-04
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