THIN FILM DEVICE WITH MINIMIZED SPATIAL VARIATION OF LOCAL MEAN HEIGHT
    1.
    发明申请
    THIN FILM DEVICE WITH MINIMIZED SPATIAL VARIATION OF LOCAL MEAN HEIGHT 有权
    具有最小化的局部平均高度的空间变化的薄膜装置

    公开(公告)号:US20090142560A1

    公开(公告)日:2009-06-04

    申请号:US11948867

    申请日:2007-11-30

    IPC分类号: B32B7/02

    摘要: This invention provides a thin film device with minimized spatial variation of local mean height. More specifically, the thin film device has a substrate and at least one first structure having a first spatially varying weighted local mean height determined by a layer weighting function. The first structure has a first maximum height, a first minimum height and a first variation for a given averaging area. A compensation structure is also provided upon the substrate, the compensation structure having a second spatially varying weighted local mean height determined by the layer weighting function. The compensation structure also has a second maximum height, a second minimum height and a second variation for the given averaging area. The first structure and compensation structure combine to provide a combined structure upon the substrate with minimized spatial variation of a combined weighted local mean.

    摘要翻译: 本发明提供一种具有最小的局部平均高度的空间变化的薄膜装置。 更具体地,薄膜器件具有衬底和至少一个具有由层加权函数确定的具有第一空间变化的加权局部平均高度的第一结构。 第一结构具有给定平均区域的第一最大高度,第一最小高度和第一变化。 还在衬底上提供补偿结构,补偿结构具有由层加权函数确定的第二空间变化的加权局部平均高度。 补偿结构还具有给定平均区域的第二最大高度,第二最小高度和第二变化。 第一结构和补偿结构结合在一起,在基底上提供组合结构,使组合加权局部平均值具有最小的空间变化。

    THIN FILM DEVICE WITH LAYER ISOLATION STRUCTURE
    2.
    发明申请
    THIN FILM DEVICE WITH LAYER ISOLATION STRUCTURE 审中-公开
    具有层隔离结构的薄膜装置

    公开(公告)号:US20090108397A1

    公开(公告)日:2009-04-30

    申请号:US11932653

    申请日:2007-10-31

    IPC分类号: H01L29/00

    摘要: This invention provides a thin film device with layer isolation structures. Specifically, a plurality of patterned thin film device layers provide a first rail and a second rail. There is at least one overpass between the first rail and the second rail. The overpass is defined by an array of spaced holes disposed transversely through the continuous material of the first rail on either side of the overpass. The holes are in communication with isolation voids adjacent to the second rail adjacent to the overpass.

    摘要翻译: 本发明提供一种具有层隔离结构的薄膜器件。 具体地,多个图案化薄膜器件层提供第一轨道和第二轨道。 在第一轨道和第二轨道之间存在至少一个立交桥。 立交桥由立交桥两侧横向穿过第一轨道的连续材料的间隔开的孔组成。 这些孔与毗邻立交桥的第二轨道相邻的隔离空洞连通。

    Thin film device with minimized spatial variation of local mean height
    3.
    发明授权
    Thin film device with minimized spatial variation of local mean height 有权
    薄膜器件具有最小的局部平均高度的空间变化

    公开(公告)号:US08765252B2

    公开(公告)日:2014-07-01

    申请号:US11948867

    申请日:2007-11-30

    摘要: This invention provides a thin film device with minimized spatial variation of local mean height. More specifically, the thin film device has a substrate and at least one first structure having a first spatially varying weighted local mean height determined by a layer weighting function. The first structure has a first maximum height, a first minimum height and a first variation for a given averaging area. A compensation structure is also provided upon the substrate, the compensation structure having a second spatially varying weighted local mean height determined by the layer weighting function. The compensation structure also has a second maximum height, a second minimum height and a second variation for the given averaging area. The first structure and compensation structure combine to provide a combined structure upon the substrate with minimized spatial variation of a combined weighted local mean.

    摘要翻译: 本发明提供一种具有最小的局部平均高度的空间变化的薄膜装置。 更具体地,薄膜器件具有衬底和至少一个具有由层加权函数确定的具有第一空间变化的加权局部平均高度的第一结构。 第一结构具有给定平均区域的第一最大高度,第一最小高度和第一变化。 还在衬底上提供补偿结构,补偿结构具有由层加权函数确定的第二空间变化的加权局部平均高度。 补偿结构还具有给定平均区域的第二最大高度,第二最小高度和第二变化。 第一结构和补偿结构结合在一起,在基底上提供组合结构,使组合加权局部平均值具有最小的空间变化。

    Method of forming at least one thin film device
    4.
    发明授权
    Method of forming at least one thin film device 有权
    形成至少一个薄膜器件的方法

    公开(公告)号:US07202179B2

    公开(公告)日:2007-04-10

    申请号:US11025750

    申请日:2004-12-22

    IPC分类号: H01L21/302 H01L21/461

    摘要: This invention provides a method of forming at least one thin film device, such as for example a thin film transistor. The method includes providing a substrate and depositing a plurality of thin film device layers upon the substrate. An imprinted 3D template structure is provided upon the plurality of thin film device layers. The plurality of thin film layers and 3D template structure are etched and at least one thin film layer is undercut.

    摘要翻译: 本发明提供一种形成至少一个薄膜器件的方法,例如薄膜晶体管。 该方法包括提供衬底并在衬底上沉积多个薄膜器件层。 在多个薄膜器件层上提供印刷的3D模板结构。 蚀刻多个薄膜层和3D模板结构,并且至少一个薄膜层被切削。

    Fabricating a structure usable in an imprint lithographic process
    5.
    发明授权
    Fabricating a structure usable in an imprint lithographic process 有权
    制造可用于压印光刻工艺的结构

    公开(公告)号:US07718077B1

    公开(公告)日:2010-05-18

    申请号:US11493478

    申请日:2006-07-25

    IPC分类号: B44C1/22

    摘要: A method of fabricating an article usable in an imprint lithographic process is disclosed. The method includes patterning masking material layers on a substrate thereby forming a multi-layer mask and sequentially removing portions of the substrate based on the multi-layer mask to thereby forming a structure usable in an imprint lithographic process.

    摘要翻译: 公开了一种制造可用于压印光刻工艺的制品的方法。 该方法包括在衬底上图案化掩模材料层,从而形成多层掩模,并且基于多层掩模依次去除衬底的部分,从而形成可用于压印光刻工艺的结构。

    Method of forming at least one thin film device
    6.
    发明申请
    Method of forming at least one thin film device 有权
    形成至少一个薄膜器件的方法

    公开(公告)号:US20060134922A1

    公开(公告)日:2006-06-22

    申请号:US11025750

    申请日:2004-12-22

    IPC分类号: H01L21/302

    摘要: This invention provides a method of forming at least one thin film device, such as for example a thin film transistor. The method includes providing a substrate and depositing a plurality of thin film device layers upon the substrate. An imprinted 3D template structure is provided upon the plurality of thin film device layers. The plurality of thin film layers and 3D template structure are etched and at least one thin film layer is undercut.

    摘要翻译: 本发明提供一种形成至少一个薄膜器件的方法,例如薄膜晶体管。 该方法包括提供衬底并在衬底上沉积多个薄膜器件层。 在多个薄膜器件层上提供印模的3D模板结构。 蚀刻多个薄膜层和3D模板结构,并且至少一个薄膜层被切削。

    Noise reduction in a hermetic rotary compressor
    7.
    发明授权
    Noise reduction in a hermetic rotary compressor 失效
    密封旋转式压缩机中的降噪

    公开(公告)号:US5605447A

    公开(公告)日:1997-02-25

    申请号:US676870

    申请日:1996-07-03

    IPC分类号: F04C29/06 F04B39/00

    摘要: The present invention concerns a noise reduction method and a noise reduction device for a hermetic rotary compressor. It is designed to reduce the very high level of low frequency sound generated by the compressor by preventing the formation of reflected waves along the circumference which produce the resonant sound mode, and thus by preventing the amplification of the low frequency gas pulsations. In the present invention, the amplitude of the reflected waves that form the resonant sound mode is reduced by installing the muffler outlets at one half the wavelength of the reflected waves in the cavity of the compressor housing from the exhaust valve where the compressed gas from the cylinder enters the muffler. By positioning these outlets to face each other so that, of the pulsating gas components form these two outlets, those at the frequency of the reflected waves formed in the circumferential direction of the cavity of the compressor housing will undergo a 180.degree. phase shift and destructively interfere with each other.

    摘要翻译: 本发明涉及一种用于密封旋转式压缩机的降噪方法和降噪装置。 旨在通过防止沿着产生共振声音模式的圆周的反射波的形成,并且因此通过防止低频气体脉动的放大来减少由压缩机产生的非常高水平的低频声音。 在本发明中,通过将消声器出口设置在压缩机壳体的空腔中的反射波的一半的一半处,从排气阀排出形成共振声音模式的反射波的振幅, 气缸进入消声器。 通过将这些出口定位成彼此面对,使得脉动气体部件形成这两个出口,在压缩机壳体的空腔的周向上形成的反射波的频率的那些将经历180°相移和破坏性 互相干扰

    SYSTEM HAVING BUSINESS AWARE FRAMEWORK FOR SUPPORTING SITUATION AWARENESS
    8.
    发明申请
    SYSTEM HAVING BUSINESS AWARE FRAMEWORK FOR SUPPORTING SITUATION AWARENESS 审中-公开
    拥有业务意识框架以支持情境意识的系统

    公开(公告)号:US20100125476A1

    公开(公告)日:2010-05-20

    申请号:US12566355

    申请日:2009-09-24

    IPC分类号: G06Q10/00 G06F17/30

    摘要: The present invention relates to a system having a business aware framework for supporting situation awareness, which provides an RFID business event modeling system having a modeling function that allows a developer to easily define RFID business events required in developing RFID applications in conformance to EPC network standards so that the user can specify the steps of acquiring and processing data using the RFID technology and define whether to infer a situation, thereby conveniently using the invention for applications based on EPC and sensor data.

    摘要翻译: 本发明涉及一种具有用于支持情境意识的业务感知框架的系统,其提供具有建模功能的RFID业务事件建模系统,其允许开发者容易地根据EPC网络标准来定义开​​发RFID应用所需的RFID业务事件 使得用户可以使用RFID技术指定获取和处理数据的步骤,并且定义是否推断情况,从而方便地使用本发明来应用于基于EPC和传感器数据的应用。

    Radio frequency identification business-aware framework
    9.
    发明申请
    Radio frequency identification business-aware framework 审中-公开
    射频识别业务感知框架

    公开(公告)号:US20090210887A1

    公开(公告)日:2009-08-20

    申请号:US12320858

    申请日:2009-02-06

    IPC分类号: G06F3/00 H04Q5/22

    CPC分类号: G06Q10/06

    摘要: A Radio Frequency Identification (RFID) has developed for Business-Aware Framework (BizAF) including a BESpec to define a process of obtaining information from at least one of RFID middleware, an EPCIS, an ONS, and an EPCIS DS of an architecture component defined in EPCNetwork in developing a real-time RFID event-based application, processing and transmitting the information, in which the BESpec includes a variable declaration part for storing processing values in the middle of processing an activity, the activity being a basic unit of the work for generating the RFID business event, an activity part for defining the processes that can be combined for generating the RFID business event, and a reference specification part for defining reference information for processing in the activity.

    摘要翻译: 射频识别(RFID)已经开发用于商业感知框架(BizAF),包括BESpec,以定义从至少一个定义的架构组件的RFID中间件,EPCIS,ONS和EPCIS DS获得信息的过程 在EPCNetwork开发基于实时RFID事件的应用程序中,处理和传输信息,其中BESpec包括一个用于在处理活动中存储处理值的变量声明部分,该活动是工作的基本单元 用于生成RFID业务事件的活动部分,用于定义可组合用于生成RFID业务事件的过程的活动部分,以及用于定义用于在该活动中处理的参考信息的参考规范部分。

    Enhanced flow compressor discharge port entrance
    10.
    发明授权
    Enhanced flow compressor discharge port entrance 失效
    增压流量压缩机排气口入口

    公开(公告)号:US06042351A

    公开(公告)日:2000-03-28

    申请号:US986451

    申请日:1997-12-08

    CPC分类号: F04C29/128

    摘要: A notch is provided in the motor end bearing of a rotary compressor in the region of the discharge port. The notch enhances the flow by smoothing the flow path and guiding the flow so as to impinge upon the discharge valve in a glancing manner and reduces the noise from the valve and valve stop and from the turbulent flow through the discharge port. The notch is located along the axis of the discharge valve and on the side of the valve port on which the valve is pivoted.

    摘要翻译: 在排出口区域的旋转式压缩机的马达端轴承上设有切口。 切口通过平滑流动路径并引导流动以以扫视方式撞击排出阀来增强流量,并且减少来自阀和阀止动件的噪声以及从通过排出口的湍流的噪声。 凹口位于排出阀的轴线和阀门枢转的阀口侧。