Invention Grant
US08778604B2 Mask set for double exposure process and method of using the mask set
有权
双面曝光工艺的面膜套和使用面膜组的方法
- Patent Title: Mask set for double exposure process and method of using the mask set
- Patent Title (中): 双面曝光工艺的面膜套和使用面膜组的方法
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Application No.: US13455113Application Date: 2012-04-24
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Publication No.: US08778604B2Publication Date: 2014-07-15
- Inventor: Hui-Fang Kuo , Ming-Jui Chen , Ting-Cheng Tseng , Cheng-Te Wang
- Applicant: Hui-Fang Kuo , Ming-Jui Chen , Ting-Cheng Tseng , Cheng-Te Wang
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G03C5/00
- IPC: G03C5/00
Abstract:
A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.
Public/Granted literature
- US20130280645A1 Mask Set for Double Exposure Process and Method of Using the Mask Set Public/Granted day:2013-10-24
Information query
