公开(公告)号：US08423923B2

公开(公告)日：2013-04-16

申请号：US13186475

申请日：2011-07-20

Applicant: Chia-Wei Huang ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Hui-Fang Kuo

Inventor： Chia-Wei Huang ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Hui-Fang Kuo

IPC: G06F17/50 ,  G03F1/00 ,  G03F7/00

CPC classification number: G03F1/70 ,  G03F1/36 ,  G03F7/70441 ,  G03F7/70466

Abstract: An optical proximity correction method is provided. A target pattern is provided, and then the target pattern is decomposed to a first pattern and a second pattern. The first pattern and the second pattern are alternately arranged in a dense region. Then, a compensation pattern is provided and it is determined whether the compensation pattern is added into the first pattern to become a first revised pattern, or into the second pattern to become a second revised pattern. Finally, the first revised pattern is output onto a first mask and the second revised pattern is output onto a second mask.

Abstract translation: 提供了一种光学邻近校正方法。 提供目标图案，然后将目标图案分解为第一图案和第二图案。 第一图案和第二图案交替地布置在致密区域中。 然后，提供补偿模式，并且确定补偿模式是否被添加到第一模式中以变为第一修改模式，或者确定是否到第二模式以变为第二修改模式。 最后，将第一修改图案输出到第一掩码上，将第二修改图案输出到第二掩码。

公开(公告)号：US08608504B2

公开(公告)日：2013-12-17

申请号：US13244644

申请日：2011-09-25

Applicant: Ting-Cheng Tseng

Inventor： Ting-Cheng Tseng

IPC: H01R12/24

CPC classification number: H01R9/034 ,  H01R12/724 ,  H01R12/88 ,  H01R13/639 ,  H01R13/6471 ,  H01R13/6592 ,  H01R13/6658 ,  H05K1/117 ,  H05K3/32 ,  H05K2201/10356

Abstract: A connector and a connector assembly are provided by the invention. The connector includes a main body formed by a printed circuit board and a plurality of cables. The printed circuit board has a surface conductive trace layer, an inner insulation layer, a ground layer and a surface insulation layer. The surface conductive trace layer has a conductive trace pattern comprising a plurality of contacting-end pattern portions and a plurality of bonding pad portions. The inner insulation layer is located on the surface conductive trace layer. The ground layer is located on the inner insulation layer. The surface insulation layer overlays the ground layer and exposes out a part of the ground layer. The cables are electrically connected to the bonding pad portions of the conductive trace patterns.

Abstract translation: 本发明提供连接器和连接器组件。 连接器包括由印刷电路板和多根电缆形成的主体。 印刷电路板具有表面导电迹线层，内部绝缘层，接地层和表面绝缘层。 表面导电迹线层具有包括多个接触端图案部分和多个接合焊盘部分的导电迹线图案。 内绝缘层位于表面导电迹线层上。 接地层位于内绝缘层上。 表面绝缘层覆盖接地层并露出一部分接地层。 电缆电连接到导电迹线图案的接合焊盘部分。

公开(公告)号：US08778604B2

公开(公告)日：2014-07-15

申请号：US13455113

申请日：2012-04-24

Applicant: Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

Inventor： Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

IPC: G03C5/00

CPC classification number: G03F7/203 ,  G03F1/70 ,  G03F7/70466

Abstract: A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.

Abstract translation: 用于双曝光处理的掩模组和使用所述掩模组的方法。 掩模组具有第一掩模图案，其具有第一基底和多个第一齿和突出部分，第二掩模图案具有第二基底和多个第二牙齿，其中第二基底可以至少部分地与 第一基座，使得每个突出部分至少部分地与第二齿中的一个齿重叠。

公开(公告)号：US08470655B1

公开(公告)日：2013-06-25

申请号：US13450334

申请日：2012-04-18

Applicant: Chun-Hsien Huang ,  Ming-Jui Chen ,  Chia-Wei Huang ,  Ting-Cheng Tseng

Inventor： Chun-Hsien Huang ,  Ming-Jui Chen ,  Chia-Wei Huang ,  Ting-Cheng Tseng

IPC: H01L21/336

CPC classification number: H01L29/0847 ,  H01L21/823807 ,  H01L21/823814 ,  H01L27/0207 ,  H01L29/165 ,  H01L29/7833 ,  H01L29/7848

Abstract: A method for designing a stressor pattern is described, wherein the stressor pattern is used to form S/D regions of a second-type MOS transistor. A first distance between a boundary of the stressor pattern and a first active area of a first-type MOS transistor is derived. If the first distance is less than a safe distance, the stressor pattern is shrunk to make the first distance at least equal to the safe distance.

Abstract translation: 描述了用于设计应力源图案的方法，其中应力源图案用于形成第二类型MOS晶体管的S / D区域。 导出应力源图案的边界与第一型MOS晶体管的第一有效区域之间的第一距离。 如果第一距离小于安全距离，则应力源模式缩小，使第一距离至少等于安全距离。

公开(公告)号：US20130024824A1

公开(公告)日：2013-01-24

申请号：US13186475

申请日：2011-07-20

Applicant: Chia-Wei Huang ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Hui-Fang Kuo

Inventor： Chia-Wei Huang ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Hui-Fang Kuo

IPC: G06F17/50

CPC classification number: G03F1/70 ,  G03F1/36 ,  G03F7/70441 ,  G03F7/70466

Abstract: An optical proximity correction method is provided. A target pattern is provided, and then the target pattern is decomposed to a first pattern and a second pattern. The first pattern and the second pattern are alternately arranged in a dense region. Then, a compensation pattern is provided and it is determined whether the compensation pattern is added into the first pattern to become a first revised pattern, or into the second pattern to become a second revised pattern. Finally, the first revised pattern is output onto a first mask and the second revised pattern is output onto a second mask.

Abstract translation: 提供了一种光学邻近校正方法。 提供目标图案，然后将目标图案分解为第一图案和第二图案。 第一图案和第二图案交替地布置在致密区域中。 然后，提供补偿模式，并且确定补偿模式是否被添加到第一模式中以变为第一修改模式，或者确定是否到第二模式以变为第二修改模式。 最后，将第一修改图案输出到第一掩码上，将第二修改图案输出到第二掩码。

公开(公告)号：US20130280645A1

公开(公告)日：2013-10-24

申请号：US13455113

申请日：2012-04-24

Applicant: Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

Inventor： Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

IPC: G03F7/20 ,  G03F1/00

CPC classification number: G03F7/203 ,  G03F1/70 ,  G03F7/70466

Abstract: A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.

Abstract translation: 用于双曝光处理的掩模组和使用所述掩模组的方法。 掩模组具有第一掩模图案，其具有第一基底和多个第一齿和突出部分，第二掩模图案具有第二基底和多个第二牙齿，其中第二基底可以至少部分地与 第一基座，使得每个突出部分至少部分地与第二齿中的一个齿重叠。

公开(公告)号：US20120190217A1

公开(公告)日：2012-07-26

申请号：US13244644

申请日：2011-09-25

Applicant: Ting-Cheng Tseng

Inventor： Ting-Cheng Tseng

IPC: H01R9/03 ,  H01R12/00 ,  H01R4/28 ,  H01R13/64

CPC classification number: H01R9/034 ,  H01R12/724 ,  H01R12/88 ,  H01R13/639 ,  H01R13/6471 ,  H01R13/6592 ,  H01R13/6658 ,  H05K1/117 ,  H05K3/32 ,  H05K2201/10356

Abstract: A connector and a connector assembly are provided by the invention. The connector includes a main body formed by a printed circuit board and a plurality of cables. The printed circuit board has a surface conductive trace layer, an inner insulation layer, a ground layer and a surface insulation layer. The surface conductive trace layer has a conductive trace pattern comprising a plurality of contacting-end pattern portions and a plurality of bonding pad portions. The inner insulation layer is located on the surface conductive trace layer. The ground layer is located on the inner insulation layer. The surface insulation layer overlays the ground layer and exposes out a part of the ground layer. The cables are electrically connected to the bonding pad portions of the conductive trace patterns.

Abstract translation: 本发明提供连接器和连接器组件。 连接器包括由印刷电路板和多根电缆形成的主体。 印刷电路板具有表面导电迹线层，内部绝缘层，接地层和表面绝缘层。 表面导电迹线层具有包括多个接触端图案部分和多个接合焊盘部分的导电迹线图案。 内绝缘层位于表面导电迹线层上。 接地层位于内绝缘层上。 表面绝缘层覆盖接地层并露出一部分接地层。 电缆电连接到导电迹线图案的接合焊盘部分。