公开(公告)号：US20140040837A1

公开(公告)日：2014-02-06

申请号：US13563684

申请日：2012-07-31

Applicant: Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Shih-Ming Kuo ,  Jing-Yi Lee

Inventor： Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Shih-Ming Kuo ,  Jing-Yi Lee

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/36

Abstract: A method of optical proximity correction (OPC) includes the following steps. At first, a layout pattern is provided to a computer system. Subsequently, the layout pattern is classified into at least a first region and at least a second region. Then, several iterations of OPC calculations are performed to the layout pattern, and a total number of OPC calculations performed in the first region is substantially larger than a total number of OPC calculations performed in the second region. Afterwards, a corrected layout pattern is outputted through the computer system onto a mask.

Abstract translation: 光学邻近校正（OPC）的方法包括以下步骤。 首先，向计算机系统提供布局图案。 随后，将布局图案分为至少第一区域和至少第二区域。 然后，对布局模式执行OPC计算的多次迭代，并且在第一区域中执行的OPC计算的总数显着大于在第二区域中执行的OPC计算的总数。 之后，校正的布局图案通过计算机系统输出到掩模上。

公开(公告)号：US20130209288A1

公开(公告)日：2013-08-15

申请号：US13704588

申请日：2011-06-17

Applicant: Cheng-Te Wang

Inventor： Cheng-Te Wang

IPC: F03D9/00

CPC classification number: F03D9/28 ,  F03D3/02 ,  F03D9/11 ,  F03D9/17 ,  Y02E10/72 ,  Y02E60/15 ,  Y02P80/22

Abstract: A wind turbine system that can comprise a wind power machine, a compressor, at least one energy accumulator, a dynamo, a pressurized heating system, and a depressurized cooling system; the wind power machine is driven by a wind power to transform wind energy into mechanical energy and to drive a compressor; the compressor pressurizes and stores gas in the energy accumulator; the energy accumulator stores and output the pressurized gas to drive the dynamo; the dynamo can comprise an air motor and an AC generator motor; wherein the air motor is driven by a gas outputted from the energy accumulator, and wherein the air motor drives the AC generator motor to generate electricity; the pressurized heating system can comprise a liquid/gas energy converter transforming hydraulic pressure into a gas pressure; the depressurized cooling system is connected between the energy accumulator and the dynamo.

Abstract translation: 一种风力涡轮机系统，其可以包括风力发电机，压缩机，至少一个蓄能器，发电机，加压加热系统和减压冷却系统; 风力发电机由风力驱动，将风能转化为机械能并驱动压缩机; 压缩机对蓄能器中的气体进行加压和储存; 蓄能器存储和输出加压气体来驱动发电机; 发电机可以包括气动马达和交流发电机马达; 其特征在于，所述气动马达由所述蓄能器输出的气体驱动，所述空气马达驱动所述交流发电马达发电; 加压加热系统可以包括将液压转换成气体压力的液体/气体能量转换器; 减压冷却系统连接在蓄能器和发电机之间。

公开(公告)号：US20130163850A1

公开(公告)日：2013-06-27

申请号：US13337376

申请日：2011-12-27

Applicant: Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Jing-Yi Lee

Inventor： Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Jing-Yi Lee

IPC: G06K9/00

CPC classification number: G03F1/36

Abstract: A mask pattern and a correcting method thereof are provided. The correcting method includes the following steps. An original pattern having a first original contour and a second original contour is provided. The first original contour has a first original corner. The second original contour has a second original corner, which is near the first original corner. The first and second original corners are cut to form a cut pattern. An optical proximity correction (OPC) process is applied to the cut pattern to form the mask pattern.

Abstract translation: 提供掩模图案及其校正方法。 校正方法包括以下步骤。 提供具有第一原始轮廓和第二原始轮廓的原始图案。 第一个原始轮廓具有第一个原始角。 第二个原始轮廓有一个第二个原始角落，靠近第一个原始角落。 第一和第二原始角被切割以形成切割图案。 将光学邻近校正（OPC）处理应用于切割图案以形成掩模图案。

公开(公告)号：US08225237B2

公开(公告)日：2012-07-17

申请号：US12324858

申请日：2008-11-27

Applicant: Te-Hung Wu ,  Sheng-Yuan Huang ,  Cheng-Te Wang ,  Chia-Wei Huang ,  Ping-I Hsieh ,  Po-I Lee ,  Chuen Huei Yang ,  Pei-Ru Tsai

Inventor： Te-Hung Wu ,  Sheng-Yuan Huang ,  Cheng-Te Wang ,  Chia-Wei Huang ,  Ping-I Hsieh ,  Po-I Lee ,  Chuen Huei Yang ,  Pei-Ru Tsai

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.

Abstract translation: 公开了一种确定处理窗口的方法。 首先，提供图案数据。 其次，确定偏差集。 然后，根据偏置设置对图案数据执行调整大小程序，以获得可用的最终调整尺寸图案作为改变区域的目标图案。 最终调整大小的模式与最小间距规则，与多边规则的联系以及与金属规则的联系是一致的。 因此，输出目标图案。

公开(公告)号：US08806391B2

公开(公告)日：2014-08-12

申请号：US13563684

申请日：2012-07-31

Applicant: Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Shih-Ming Kuo ,  Jing-Yi Lee

Inventor： Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Shih-Ming Kuo ,  Jing-Yi Lee

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/36

Abstract: A method of optical proximity correction (OPC) includes the following steps. At first, a layout pattern is provided to a computer system. Subsequently, the layout pattern is classified into at least a first region and at least a second region. Then, several iterations of OPC calculations are performed to the layout pattern, and a total number of OPC calculations performed in the first region is substantially larger than a total number of OPC calculations performed in the second region. Afterwards, a corrected layout pattern is outputted through the computer system onto a mask.

Abstract translation: 光学邻近校正（OPC）的方法包括以下步骤。 首先，向计算机系统提供布局图案。 随后，将布局图案分为至少第一区域和至少第二区域。 然后，对布局模式执行OPC计算的多次迭代，并且在第一区域中执行的OPC计算的总数显着大于在第二区域中执行的OPC计算的总数。 之后，校正的布局图案通过计算机系统输出到掩模上。

公开(公告)号：US20100131914A1

公开(公告)日：2010-05-27

申请号：US12324858

申请日：2008-11-27

Applicant: Te-Hung Wu ,  Sheng-Yuan Huang ,  Cheng-Te Wang ,  Chia-Wei Huang ,  Ping-I Hsieh ,  Po-I Lee ,  Chuen Huei Yang ,  Pei-Ru Tsai

Inventor： Te-Hung Wu ,  Sheng-Yuan Huang ,  Cheng-Te Wang ,  Chia-Wei Huang ,  Ping-I Hsieh ,  Po-I Lee ,  Chuen Huei Yang ,  Pei-Ru Tsai

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.

Abstract translation: 公开了一种确定处理窗口的方法。 首先，提供图案数据。 其次，确定偏差集。 然后，根据偏置设置对图案数据执行调整大小程序，以获得可用的最终调整尺寸图案作为改变区域的目标图案。 最终调整大小的模式与最小间距规则，与多边规则的联系以及与金属规则的联系是一致的。 因此，输出目标图案。

公开(公告)号：US08885917B2

公开(公告)日：2014-11-11

申请号：US13337376

申请日：2011-12-27

Applicant: Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Jing-Yi Lee

Inventor： Te-Hsien Hsieh ,  Ming-Jui Chen ,  Cheng-Te Wang ,  Jing-Yi Lee

IPC: G06K9/00

CPC classification number: G03F1/36

Abstract: A mask pattern and a correcting method thereof are provided. The correcting method includes the following steps. An original pattern having a first original contour and a second original contour is provided. The first original contour has a first original corner. The second original contour has a second original corner, which is near the first original corner. The first and second original corners are cut to form a cut pattern. An optical proximity correction (OPC) process is applied to the cut pattern to form the mask pattern.

Abstract translation: 提供掩模图案及其校正方法。 校正方法包括以下步骤。 提供具有第一原始轮廓和第二原始轮廓的原始图案。 第一个原始轮廓具有第一个原始角。 第二个原始轮廓有一个第二个原始角落，靠近第一个原始角落。 第一和第二原始角被切割以形成切割图案。 将光学邻近校正（OPC）处理应用于切割图案以形成掩模图案。

公开(公告)号：US08778604B2

公开(公告)日：2014-07-15

申请号：US13455113

申请日：2012-04-24

Applicant: Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

Inventor： Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

IPC: G03C5/00

CPC classification number: G03F7/203 ,  G03F1/70 ,  G03F7/70466

Abstract: A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.

Abstract translation: 用于双曝光处理的掩模组和使用所述掩模组的方法。 掩模组具有第一掩模图案，其具有第一基底和多个第一齿和突出部分，第二掩模图案具有第二基底和多个第二牙齿，其中第二基底可以至少部分地与 第一基座，使得每个突出部分至少部分地与第二齿中的一个齿重叠。

公开(公告)号：US08383299B2

公开(公告)日：2013-02-26

申请号：US13109006

申请日：2011-05-17

Applicant: Te-Hsien Hsieh ,  Ming-Jui Chen ,  Shih-Ming Kuo ,  Ping-I Hsieh ,  Cheng-Te Wang ,  Jing-Yi Lee

Inventor： Te-Hsien Hsieh ,  Ming-Jui Chen ,  Shih-Ming Kuo ,  Ping-I Hsieh ,  Cheng-Te Wang ,  Jing-Yi Lee

IPC: G03F1/36

CPC classification number: G03F1/50 ,  G03F1/70 ,  G03F7/203 ,  H01L21/0274

Abstract: A double patterning mask set includes a first mask having a first set of via patterns, and a second mask having a second set of via patterns. The first set of via patterns includes at least two via patterns arranged along a diagonal direction, each of the at least two via patterns has at least a truncated corner. The first set of via patterns and the second set of via patterns are interlacedly arranged along a horizontal direction and a vertical direction.

Abstract translation: 双重图案掩模组包括具有第一组通孔图案的第一掩模和具有第二组通孔图案的第二掩模。 第一组通孔图案包括沿着对角线方向布置的至少两个通孔图案，至少两个通孔图案中的每一个具有至少一个截头角。 第一组通孔图案和第二组通孔图案沿水平方向和垂直方向交错布置。

公开(公告)号：US20130280645A1

公开(公告)日：2013-10-24

申请号：US13455113

申请日：2012-04-24

Applicant: Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

Inventor： Hui-Fang Kuo ,  Ming-Jui Chen ,  Ting-Cheng Tseng ,  Cheng-Te Wang

IPC: G03F7/20 ,  G03F1/00

CPC classification number: G03F7/203 ,  G03F1/70 ,  G03F7/70466

Abstract: A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.

Abstract translation: 用于双曝光处理的掩模组和使用所述掩模组的方法。 掩模组具有第一掩模图案，其具有第一基底和多个第一齿和突出部分，第二掩模图案具有第二基底和多个第二牙齿，其中第二基底可以至少部分地与 第一基座，使得每个突出部分至少部分地与第二齿中的一个齿重叠。