发明授权
US08790860B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same
有权
光敏感或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，电子器件的制备方法和电子器件，各自使用它们
- 专利标题： Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same
- 专利标题（中）： 光敏感或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，电子器件的制备方法和电子器件，各自使用它们
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申请号： US13610271申请日： 2012-09-11
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公开(公告)号： US08790860B2公开(公告)日： 2014-07-29
- 发明人: Kosuke Koshijima , Hidenori Takahashi , Shuhei Yamaguchi , Kei Yamamoto
- 申请人： Kosuke Koshijima , Hidenori Takahashi , Shuhei Yamaguchi , Kei Yamamoto
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2011-207016 20110922
- 主分类号： G03F7/038
- IPC分类号： G03F7/038 ; G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/32
摘要：
An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin containing 30 mol % or more of a repeating unit (a) represented by the following general formula (I) based on all the repeating units; (B) a compound capable of generating an acid upon irradiation of actinic rays or radiation; and (G) a compound having at least one of a fluorine atom and a silicon atom, and further having basicity or being capable of increasing the basicity by an action of an acid:
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