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1.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same 有权光敏感或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，电子器件的制备方法和电子器件，各自使用它们公开(公告)号：US08790860B2
公开(公告)日：2014-07-29
申请号：US13610271
申请日：2012-09-11
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0755 , G03F7/0758 , G03F7/11 , G03F7/2041 , G03F7/40 , Y10T428/24479
摘要： An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin containing 30 mol % or more of a repeating unit (a) represented by the following general formula (I) based on all the repeating units; (B) a compound capable of generating an acid upon irradiation of actinic rays or radiation; and (G) a compound having at least one of a fluorine atom and a silicon atom, and further having basicity or being capable of increasing the basicity by an action of an acid:
摘要翻译： 能够形成具有超细孔径（例如60nm以下）的孔图案并且具有优异的局部图案尺寸均匀性的截面形状优异的光化射线敏感或辐射敏感性树脂组合物; 并且提供了各自使用它们的抗蚀剂膜，图案形成方法，制备电子设备的方法和电子设备。 光化射线敏感性或辐射敏感性树脂组合物包含（P）基于所有重复单元含有30mol％以上由以下通式（I）表示的重复单元（a）的树脂的树脂; （B）能够在光化射线或辐射照射时能产生酸的化合物; 和（G）具有氟原子和硅原子中的至少一个的化合物，并且还具有碱性或能够通过酸的作用增加碱度：
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2.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the same 有权光敏性或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，电子器件制造方法和电子器件，各自使用它们公开(公告)号：US09244344B2
公开(公告)日：2016-01-26
申请号：US13614872
申请日：2012-09-13
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325 , Y10T428/24802
摘要： An actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) generating organic acid by irradiation of actinic ray or radiation, and 1% by mass or more of a resin (C) which has at least one of a fluorine atom and a silicon atom and is different from the resin (P) with regard to total solids of the actinic ray-sensitive or radiation-sensitive resin composition, wherein, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a straight chain or branched alkyl group.
摘要翻译： 本发明的光化射线敏感性或辐射敏感性树脂组合物包括具有由通式（I）表示的重复单元（a）的树脂（P），通过光化射线照射产生有机酸的化合物（B） 或辐射，和1质量％以上的具有氟原子和硅原子中的至少一个并且与树脂（P）不同的树脂（C）相对于光化射线敏感的总固体或 辐射敏感性树脂组合物，其中，在通式（I）中，R 0表示氢原子或甲基，R 1，R 2和R 3各自独立地表示直链或支链烷基。
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3.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME 有权丙烯酸类敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，电子设备制造方法和电子设备，每个使用它们公开(公告)号：US20130078434A1
公开(公告)日：2013-03-28
申请号：US13614872
申请日：2012-09-13
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325 , Y10T428/24802
摘要： An actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) generating organic acid by irradiation of actinic ray or radiation, and 1% by mass or more of a resin (C) which has at least one of a fluorine atom and a silicon atom and is different from the resin (P) with regard to total solids of the actinic ray-sensitive or radiation-sensitive resin composition, wherein, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a straight chain or branched alkyl group.
摘要翻译： 本发明的光化射线敏感性或辐射敏感性树脂组合物包括具有由通式（I）表示的重复单元（a）的树脂（P），通过光化射线照射产生有机酸的化合物（B） 或辐射，和1质量％以上的具有氟原子和硅原子中的至少一个并且与树脂（P）不同的树脂（C）相对于光化射线敏感的总固体或 辐射敏感性树脂组合物，其中，在通式（I）中，R 0表示氢原子或甲基，R 1，R 2和R 3各自独立地表示直链或支链烷基。
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4.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH USING THE SAME 有权化学敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，制备电子器件的方法和使用其的电子器件公开(公告)号：US20130078426A1
公开(公告)日：2013-03-28
申请号：US13610271
申请日：2012-09-11
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0755 , G03F7/0758 , G03F7/11 , G03F7/2041 , G03F7/40 , Y10T428/24479
摘要： An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin containing 30 mol % or more of a repeating unit (a) represented by the following general formula (I) based on all the repeating units; (B) a compound capable of generating an acid upon irradiation of actinic rays or radiation; and (G) a compound having at least one of a fluorine atom and a silicon atom, and further having basicity or being capable of increasing the basicity by an action of an acid:
摘要翻译： 能够形成具有超细孔径（例如60nm以下）的孔图案并且具有优异的局部图案尺寸均匀性的截面形状优异的光化射线敏感或辐射敏感性树脂组合物; 并且提供了各自使用它们的抗蚀剂膜，图案形成方法，制备电子设备的方法和电子设备。 光化射线敏感性或辐射敏感性树脂组合物包含（P）基于所有重复单元含有30mol％以上由以下通式（I）表示的重复单元（a）的树脂的树脂; （B）能够在光化射线或辐射照射时能产生酸的化合物; 和（G）具有氟原子和硅原子中的至少一个的化合物，并且还具有碱性或能够通过酸的作用增加碱度：
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