发明授权
- 专利标题: High density gallium nitride devices using island topology
- 专利标题(中): 使用岛拓扑的高密度氮化镓器件
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申请号: US13641003申请日: 2011-04-13
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公开(公告)号: US08791508B2公开(公告)日: 2014-07-29
- 发明人: John Roberts , Ahmad Mizan , Girvan Patterson , Greg Klowak
- 申请人: John Roberts , Ahmad Mizan , Girvan Patterson , Greg Klowak
- 申请人地址: CA Ottawa
- 专利权人: GaN Systems Inc.
- 当前专利权人: GaN Systems Inc.
- 当前专利权人地址: CA Ottawa
- 国际申请: PCT/CA2011/000396 WO 20110413
- 国际公布: WO2011/127568 WO 20111020
- 主分类号: H01L23/528
- IPC分类号: H01L23/528 ; H01L29/417 ; H01L29/423 ; H01L21/8252 ; H01L27/06 ; H01L29/20 ; H01L23/00 ; H01L29/40 ; H01L27/085
摘要:
A Gallium Nitride (GaN) series of devices—transistors and diodes are disclosed—that have greatly superior current handling ability per unit area than previously described GaN devices. The improvement is due to improved layout topology. The devices also include a simpler and superior flip chip connection scheme and a means to reduce the thermal resistance. A simplified fabrication process is disclosed and the layout scheme which uses island electrodes rather than finger electrodes is shown to increase the active area density by two to five times that of conventional interdigitated structures. Ultra low on resistance transistors and very low loss diodes can be built using the island topology. Specifically, the present disclosure provides a means to enhance cost/effective performance of all lateral GaN structures.
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