发明授权
US08822138B2 Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring
有权
用于形成光刻用抗蚀剂下层膜的组合物,包括含有脂环族环和芳环的树脂
- 专利标题: Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring
- 专利标题(中): 用于形成光刻用抗蚀剂下层膜的组合物,包括含有脂环族环和芳环的树脂
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申请号: US13389682申请日: 2010-08-11
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公开(公告)号: US08822138B2公开(公告)日: 2014-09-02
- 发明人: Tetsuya Shinjo , Hirokazu Nishimaki , Yasushi Sakaida , Keisuke Hashimoto
- 申请人: Tetsuya Shinjo , Hirokazu Nishimaki , Yasushi Sakaida , Keisuke Hashimoto
- 申请人地址: JP Tokyo
- 专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2009-189700 20090819
- 国际申请: PCT/JP2010/063631 WO 20100811
- 国际公布: WO2011/021555 WO 20110224
- 主分类号: G03F7/11
- IPC分类号: G03F7/11 ; H01L21/027 ; C08G65/332 ; G03F7/09 ; G03F7/075
摘要:
There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product (C) of an alicyclic epoxy polymer (A) with a condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B). The alicyclic epoxy polymer (A) may include a repeating structural unit of Formula (1): (T is a repeating unit structure containing an alicyclic ring in the polymer main chain; and E is an epoxy group or an organic group containing an epoxy group). The condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B) may include a condensed-ring aromatic carboxylic acid (B1) and a monocyclic aromatic carboxylic acid (B2) in a molar ratio of B1:B2=3:7 to 7:3. The condensed-ring aromatic carboxylic acid (B1) may be 9-anthracenecarboxylic acid and the monocyclic aromatic carboxylic acid (B2) may be benzoic acid.