发明授权
- 专利标题: Lithographic apparatus and a method of operating the apparatus
- 专利标题(中): 光刻设备和操作该设备的方法
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申请号: US12428237申请日: 2009-04-22
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公开(公告)号: US08823918B2公开(公告)日: 2014-09-02
- 发明人: Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
- 申请人: Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/52
- IPC分类号: G03B27/52
摘要:
A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.