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公开(公告)号：US08462313B2
公开(公告)日：2013-06-11
申请号：US12818724
申请日：2010-06-18
Applicant: Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
Inventor： Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
Abstract translation: 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。
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公开(公告)号：US08928857B2
公开(公告)日：2015-01-06
申请号：US12770356
申请日：2010-04-29
Applicant: Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
Inventor： Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
CPC classification number: G03F7/70341 , G03B27/52 , G03F7/70891
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Abstract translation: 一种包括投影系统和液体限制结构的光刻设备，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构以及衬底和/或衬底台限定的浸没空间中，其中采取措施 以减少液滴和/或液膜对投影系统的最后一个元件的影响。
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公开(公告)号：US20110007287A1
公开(公告)日：2011-01-13
申请号：US12818724
申请日：2010-06-18
Applicant: Johannes Henricus Wilhelmus JACOBS , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
Inventor： Johannes Henricus Wilhelmus JACOBS , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC: G03B27/58
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
Abstract translation: 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。
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公开(公告)号：US20100066987A1
公开(公告)日：2010-03-18
申请号：US12559664
申请日：2009-09-15
Applicant: Jeroen Peter Johannes BRUIJSTENS , Richard Joseph BRULS , Hans JANSEN , Siebe LANDHEER , Laurentius Catrinus JORRITSMA , Arnout Johannes MEESTER , Bauke JANSEN , Ivo Adam Johannes Thomas , Marcio Alexandre Cano MIRANDA , Maurice Martinus Johannes VAN DER LEE , Gheorghe TANASA , Lambertus Dominicus NOORDAM
Inventor： Jeroen Peter Johannes BRUIJSTENS , Richard Joseph BRULS , Hans JANSEN , Siebe LANDHEER , Laurentius Catrinus JORRITSMA , Arnout Johannes MEESTER , Bauke JANSEN , Ivo Adam Johannes Thomas , Marcio Alexandre Cano MIRANDA , Maurice Martinus Johannes VAN DER LEE , Gheorghe TANASA , Lambertus Dominicus NOORDAM
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Abstract translation: 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。
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5.发明授权Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure 有权具有在投影系统和液体限制结构之间的屏障的浸没式光刻设备公开(公告)号：US09176371B2
公开(公告)日：2015-11-03
申请号：US12559664
申请日：2009-09-15
Applicant: Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Abstract translation: 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。
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Patent Agency Ranking
公开(公告)号：US08823918B2
公开(公告)日：2014-09-02
申请号：US12428237
申请日：2009-04-22
Applicant: Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
Inventor： Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
Abstract translation: 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。
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7.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD 审中-公开流体处理结构，平面设备和设备制造方法公开(公告)号：US20100060868A1
公开(公告)日：2010-03-11
申请号：US12550481
申请日：2009-08-31
Applicant: Gheorghe Tanasa , Nicolaas Ten Kate , Johannes Petrus Martinus Bernardus Vermeulen , Danny Maria Hubertus Philips , Maikel Adrianus Cornelis Schepers , Laurentius Johannes Adrianus Van Bokhoven
Inventor： Gheorghe Tanasa , Nicolaas Ten Kate , Johannes Petrus Martinus Bernardus Vermeulen , Danny Maria Hubertus Philips , Maikel Adrianus Cornelis Schepers , Laurentius Johannes Adrianus Van Bokhoven
CPC classification number: G03F7/70341 , Y10T137/87169
Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.
Abstract translation: 公开了一种流体处理结构，其被设计用于所有湿式浸渍光刻。 流体处理结构具有第一开口以将流体提供到投影系统的最终元件与基板和/或基板台之间的空间，阻挡液体流出流体处理结构和流体处理结构之间的空间的屏障 基板和第二开口，该第二开口通向该空间的径向外侧的区域，以将流体从流体处理结构提供到该空间的径向向外的基板和/或基板台的顶表面上。 可以设置控制器，使得朝向衬底台的中心的流体流大于离开衬底台的中心的方向的流体流动。
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公开(公告)号：US20090284715A1
公开(公告)日：2009-11-19
申请号：US12428237
申请日：2009-04-22
Applicant: Robert Douglas Watso , Youri Johannes Laurentius Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
Inventor： Robert Douglas Watso , Youri Johannes Laurentius Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
Abstract translation: 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体发泡。 还公开了热隔离岛的使用以及其最佳位置。
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9.发明授权Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure 有权平版印刷设备和在投影系统和液体限制结构之间具有潮湿气体空间的装置的操作方法公开(公告)号：US08730447B2
公开(公告)日：2014-05-20
申请号：US12559813
申请日：2009-09-15
Applicant: Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
Abstract translation: 一种光刻设备，包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中，其中湿气体空间 被限定在投影系统，液体限制结构和浸没空间中的浸没液体之间，湿气空间被配置为容纳湿气。
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公开(公告)号：US20100296067A1
公开(公告)日：2010-11-25
申请号：US12770356
申请日：2010-04-29
Applicant: Ivo Adam Johannes THOMAS , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
Inventor： Ivo Adam Johannes THOMAS , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03B27/52 , G03F7/70891
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Abstract translation: 一种包括投影系统和液体限制结构的光刻设备，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构以及衬底和/或衬底台限定的浸没空间中，其中采取措施 以减少液滴和/或液膜对投影系统的最后一个元件的影响。
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