Invention Grant
- Patent Title: Vapor deposition device, vapor deposition method, and method of manufacturing organic electroluminescent display device
- Patent Title (中): 气相沉积装置,气相沉积法和制造有机电致发光显示装置的方法
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Application No.: US13997173Application Date: 2011-12-19
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Publication No.: US08845808B2Publication Date: 2014-09-30
- Inventor: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2010-288814 20101224
- International Application: PCT/JP2011/079294 WO 20111219
- International Announcement: WO2012/086568 WO 20120628
- Main IPC: C23C14/26
- IPC: C23C14/26 ; C23C16/448 ; H05B33/10 ; C23C14/24 ; H01L21/02 ; H01L51/00 ; H01L51/56

Abstract:
A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), the vapor deposition device including a vapor deposition source (80) that has an injection hole (81) from which vapor deposition particles are injected, a vapor deposition particle crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80), and a rotation motor (86) for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source (80).
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