发明授权
US08851092B2 Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium
有权
清洁装置和清洁方法，涂布机/显影剂和涂布和显影方法以及计算机可读存储介质
- 专利标题： Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium
- 专利标题（中）： 清洁装置和清洁方法，涂布机/显影剂和涂布和显影方法以及计算机可读存储介质
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申请号： US12366198申请日： 2009-02-05
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公开(公告)号： US08851092B2公开(公告)日： 2014-10-07
- 发明人: Taro Yamamoto , Naoto Yoshitaka , Shuichi Nishikido , Yoichi Tokunaga
- 申请人： Taro Yamamoto , Naoto Yoshitaka , Shuichi Nishikido , Yoichi Tokunaga
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2008-030857 20080212
- 主分类号： B08B3/00
- IPC分类号： B08B3/00 ; H01L21/67 ; G03F7/16
摘要：
A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.