-
1.发明授权Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium 有权清洁装置和清洁方法，涂布机/显影剂和涂布和显影方法以及计算机可读存储介质公开(公告)号：US08851092B2
公开(公告)日：2014-10-07
申请号：US12366198
申请日：2009-02-05
CPC分类号： B05D3/105 , B05D3/065 , B05D5/06 , G03F7/168 , H01L21/67046 , H01L21/67051
摘要： A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
摘要翻译： 清洁装置包括：第一基板保持部，其构造成保持基板的背面的第一区域，使得顶面保持面朝上; 第二基板保持部构造成保持基板的背面的第二区域，第二区域与第一区域不重叠，并旋转基板; 顶表面清洁喷嘴，其构造成将顶表面清洁流体供应到所述基板的顶表面; 斜面清洁喷嘴，其构造成将倾斜清洁流体供应到所述基板的斜面部分; 清洗液供给部，其构造成将后表面清洗液供给到由所述第一或第二基板保持部保持的基板的背面; 以及清洁部件，其构造成清洁由所述第一或第二基板保持部保持的所述基板的背面。
-
2.发明申请CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM 有权清洁装置和清洁方法，涂料/开发商和涂料和开发方法以及计算机可读存储介质公开(公告)号：US20090202951A1
公开(公告)日：2009-08-13
申请号：US12366198
申请日：2009-02-05
CPC分类号： B05D3/105 , B05D3/065 , B05D5/06 , G03F7/168 , H01L21/67046 , H01L21/67051
摘要： A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
摘要翻译： 清洁装置包括：第一基板保持部，其构造成保持基板的背面的第一区域，使得顶面保持面朝上; 第二基板保持部构造成保持基板的背面的第二区域，第二区域与第一区域不重叠，并旋转基板; 顶表面清洁喷嘴，其构造成将顶表面清洁流体供应到所述基板的顶表面; 斜面清洁喷嘴，其构造成将倾斜清洁流体供应到所述基板的斜面部分; 清洗液供给部，其构造成将后表面清洗液供给到由所述第一或第二基板保持部保持的基板的背面; 以及清洁部件，其构造成清洁由所述第一或第二基板保持部保持的所述基板的背面。
-
搜索结果
2 条记录 (耗时 0.019 秒)
