发明授权
- 专利标题： Method and apparatus for detecting plasma unconfinement
- 专利标题（中）： 用于检测等离子体无约束的方法和装置
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申请号： US13584646申请日： 2012-08-13
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公开(公告)号： US08852384B2公开(公告)日： 2014-10-07
- 发明人: KeeChan Kim , Yunsang Kim , Andrew D. Bailey, III
- 申请人： KeeChan Kim , Yunsang Kim , Andrew D. Bailey, III
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Martine Penilla Group, LLP
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065 ; H01L21/67 ; G01N21/68
摘要：
A method for detecting plasma unconfinement in a reaction chamber during a bevel edge cleaning operation is provided. The method initiates with selecting a wavelength associated with expected by products of a bevel edge clean process. The method includes cleaning the bevel edge area of a substrate and monitoring the intensity of the selected wavelengths during the cleaning for deviation from a threshold wavelength intensity. The cleaning is terminated if the deviation from the threshold wavelength intensity exceeds a target deviation.
公开/授权文献
- US20120305189A1 Method and Apparatus for Detecting Plasma Unconfinement 公开/授权日：2012-12-06
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