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US08859040B2 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates 有权
将原子层沉积涂层施加到多孔非陶瓷衬底上的方法

Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
Abstract:
A method of depositing a conformal coating on a porous non-ceramic substrate requires reactive gases to flow through the substrate so as to leave a conformal coating behind. The process can be used to leave a hydrophilic surface on the interior pores of the substrate, even when the substrate is of a naturally hydrophobic, e.g., olefinic material. The method can be used in a roll-to-roll process, or in a batch process. In some convenient embodiments of the latter case, the batch reactor and the conformally coated substrate or substrates can together go on to be come part of the end product, e.g., a filter body and the filter elements respectively.
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