Invention Grant
US08859040B2 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
有权
将原子层沉积涂层施加到多孔非陶瓷衬底上的方法
- Patent Title: Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
- Patent Title (中): 将原子层沉积涂层施加到多孔非陶瓷衬底上的方法
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Application No.: US13392213Application Date: 2010-09-15
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Publication No.: US08859040B2Publication Date: 2014-10-14
- Inventor: Bill H. Dodge
- Applicant: Bill H. Dodge
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent James A. Baker
- International Application: PCT/US2010/048902 WO 20100915
- International Announcement: WO2011/037798 WO 20110331
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/455 ; D06M23/00 ; D06C29/00 ; D06M11/36 ; D06M11/58 ; C23C16/40 ; C08J9/36 ; D06M11/53 ; D06M11/45 ; C23C16/04 ; H01L21/02

Abstract:
A method of depositing a conformal coating on a porous non-ceramic substrate requires reactive gases to flow through the substrate so as to leave a conformal coating behind. The process can be used to leave a hydrophilic surface on the interior pores of the substrate, even when the substrate is of a naturally hydrophobic, e.g., olefinic material. The method can be used in a roll-to-roll process, or in a batch process. In some convenient embodiments of the latter case, the batch reactor and the conformally coated substrate or substrates can together go on to be come part of the end product, e.g., a filter body and the filter elements respectively.
Public/Granted literature
- US20120171376A1 METHOD OF APPLYING ATOMIC LAYER DEPOSITION COATINGS ONTO POROUS NON-CERAMIC SUBSTRATES Public/Granted day:2012-07-05
Information query
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