Invention Grant
- Patent Title: Multi-spot illumination for wafer inspection
- Patent Title (中): 多点照明用于晶圆检查
-
Application No.: US13898470Application Date: 2013-05-21
-
Publication No.: US08879056B2Publication Date: 2014-11-04
- Inventor: Guoheng Zhao , Azmi Kadkly
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corp.
- Current Assignee: KLA-Tencor Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/95 ; F21V5/00

Abstract:
Illumination subsystems for multi-spot wafer inspection are provided. One illumination subsystem includes a diffractive optical element configured to separate an illumination light beam into multiple light beams and a refractive lens array positioned in the path of the multiple light beams. The refractive lens array is configured to relay the laser beam waist at the diffractive optical element onto a wafer surface and to separately and simultaneously focus each of the multiple light beams to a wafer for inspection.
Public/Granted literature
- US20130250582A1 Multi-Spot Illumination for Wafer Inspection Public/Granted day:2013-09-26
Information query