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US08879056B2 Multi-spot illumination for wafer inspection 有权
多点照明用于晶圆检查

Multi-spot illumination for wafer inspection
Abstract:
Illumination subsystems for multi-spot wafer inspection are provided. One illumination subsystem includes a diffractive optical element configured to separate an illumination light beam into multiple light beams and a refractive lens array positioned in the path of the multiple light beams. The refractive lens array is configured to relay the laser beam waist at the diffractive optical element onto a wafer surface and to separately and simultaneously focus each of the multiple light beams to a wafer for inspection.
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