发明授权
US08889901B2 Photoacid generator, method for producing the same, and resist composition comprising the same
有权
光生酸产生剂，其制备方法和含有它的抗蚀剂组合物
- 专利标题： Photoacid generator, method for producing the same, and resist composition comprising the same
- 专利标题（中）： 光生酸产生剂，其制备方法和含有它的抗蚀剂组合物
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申请号： US13367762申请日： 2012-02-07
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公开(公告)号： US08889901B2公开(公告)日： 2014-11-18
- 发明人: Jung Hoon Oh , Dae Kyung Yoon , Yong Hwa Hong , Seung Duk Cho
- 申请人： Jung Hoon Oh , Dae Kyung Yoon , Yong Hwa Hong , Seung Duk Cho
- 申请人地址： unknown Seoul
- 专利权人： Korea Kumho Petrochemical Co., Ltd.
- 当前专利权人： Korea Kumho Petrochemical Co., Ltd.
- 当前专利权人地址： unknown Seoul
- 代理机构： Davidson, Davidson & Kappel LLC
- 优先权： KR1020110010654 20110207
- 主分类号： C07C309/10
- IPC分类号： C07C309/10 ; G03F7/00 ; C07C381/12 ; G03F7/039 ; G03F7/004
摘要：
A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.